Sputter deposition of tungsten trioxide for gas sensing applications

Journal of Materials Science: Materials in Electronics

Volumn 9, Issue 4, 1998, Pages 317-322

  Di Giulio, M ^a   Manno, D ^a   Micocci, G ^a   Serra, A ^a   Tepore, A ^a  

^a UNIVERSITY OF SALENTO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; ELECTRIC PROPERTIES; ELECTRIC VARIABLES MEASUREMENT; FILM GROWTH; HALL EFFECT; OPTICAL PROPERTIES; SPECTROPHOTOMETRY; SPUTTER DEPOSITION; STRUCTURE (COMPOSITION); THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; CHEMICAL SENSORS; LIGHT ABSORPTION; ULTRAVIOLET SPECTROPHOTOMETERS;

GAS SENSING APPLICATIONS; OPTICAL ABSORPTION EDGE CHARACTERISTICS; TUNGSTEN TRIOXIDE; TUNGSTEN TRIOXIDE THIN FILMS;

TUNGSTEN COMPOUNDS;

EID: 0032131623     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1008889009741     Document Type: Article

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