Effect of a floating electrode on a plasma jet

Physics of Plasmas

Volumn 20, Issue 8, 2013, Pages

  Hu, J T ^a   Wang, J G ^a   Liu, X Y ^a   Liu, D W ^a   Lu, X P ^a   Shi, J J ^b   Ostrikov, K ^c  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b DONGHUA UNIVERSITY   (China)

^c CSIRO   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; ELECTRIC FIELDS; ELECTRODES; GROUNDING ELECTRODES; PLASMA JETS;

COVERED ELECTRODES; DIELECTRIC BARRIER; FLOATING ELECTRODES; HELIUM CONCENTRATIONS; PLASMA BULLETS; PLASMA CHANNEL; POWER ELECTRODES; RING ELECTRODES;

ELECTRIC DISCHARGES;

EID: 84907513710     PISSN: 1070664X     EISSN: 10897674     Source Type: Journal    
DOI: 10.1063/1.4817954     Document Type: Article

References (28)

1. F. Roman, V. Cooray, and V. Scuka, J. Electrost. 37. 67 (1996).
2. G. Fridman, M. Peddinghaus. M. Balasubramanian, H. Avail. A. Fridnian. A. Gulsol, and A. Brooks, Plasma Chem. Plasma Process. 26, 425 (2006).
3. H. W. Lee, S. H. Nam, A.-A. H. Mohamed, G. C. Kim. and J. K. Lee. Plasma Processes Polym. 7, 274 (2010).
4. T.-C. Tsai and D. Staack, Plasma Processes Polym. 8, 523 (2011).
5. Q.-Y. Nie, C.-S. Ren, D.-Z. Wang, and J.-L. Zhang, Appl. Phys. Lett. 93. 011503 (2008).
6. Z.-B. Wang, G.-X. Chen. Z. Wang. N. Ge, H.-P. Li, and C.-Y. Bao. J. Appl. Phys. 110. 033308 (2011).
7. X. Lu, Z. Jiang, Q. Xiong, Z. Tang, and Y. Pan, Appl. Phys. Lett. 92. 151504 (2008).
8. X. Lu, M. Laroussi, and V. Puech, Plasma Sources Sci. Technol 21. 034005 (2012).
9. U. Kogelschalz, Plasma Chem. Plasma Process. 23. 1 (2003).
10. J. Walsh and M. Kong. Appl. Phys. Lett. 93, 111501 (2008).
11. E. Karakas, M. Koklu, and M. Laroussi, J. Phys. D 43, 155202 (2010).
12. M. Yousfi, O. Eichwald, N. Merbahi, and N. Jomaa, Plasma Sources Sci. Technol. 21. 045003 (2012).
13. N. Mericam-Bourdel. M. Laroussi, A. Begum, and E. Karakas, J. Phys. D 42, 055207 (2009).
14. D. Breden, K. Miki, and L. L. Raja, Plasma Sources Sci. Technol. 21, 034011 (2012).
15. Q. T. Algwari and D. O'Connell, Appl. Phys. Lett. 99, 121501 (2011).
16. J.-P. Boeul', L. L. Yang, and L. C. Pitchford. J. Phys. D 46. 015201 (2013).
17. S. Wu, Q. Huang, Z. Wang, and X. Lu, IEEE Trans. Plasma Sci. 39. 2286 (2011)
18. J. T. Hu, X. Y. Liu. J. H. Liu. Z. L. Xiong. D. W. Liu. X. P. Lu. F. Iza. and M. G. Kong. Phys. Plasmas 19. 063505 (2012).
19. X. Y. Liu, J. T. Hu, J. H. Liu, Z. L. Xiong, D. W. Liu, X. P. Lu. and J. J. Shi, Appl. Phys. Lett. 101. 043705 (2012).
20. J. He, J. Hu, D. Liu, and Y.-T. Zhang, Plasma Sources Sci. Technol. 22. 035008 (2013).
21. D. W. Liu. F. Iza. and M. G. Kong. Appl. Phys. Lett. 95, 031501 (2009).
22. J. H. Liu, X. Y. Liu, K. Hu, D. W. Liu. X. P. Lu. F. Iza. and M. G. Kong, Appl. Phys. Lett. 98, 151502 (2011).
23. P. Segur, A. Bourdon, E. Marode, D. Bessieres, and J. H. Paillol, Plasma Sources Sci. Technol. 15, 648 (2006).
24. J. J. Shi, J. Zhang. G. Qiu. J. L. Walsh, and M. G. Kong, Appl. Phys Lett 93, 041502 (2008).
25. J. Shi, F. Zhong. J. Zhang, D. W. Liu, and M. G. Kong. Phys. Plasmas 15, 013504 (2008).
26. A. Bohle, O. Ivanov, A. Kolisko, U. Kortshagen, H. Schliiter. and A. Vikharev, J. Phys. D 29, 369 (1996).
27. R. S. Sigmond. J. Appl. Phys. 56. 1355 (1984).
28. K. Ostrikov, E. C. Neyts, and M. Mcyyappan, Adv. Phys. 62, 113 (2013).