-
1
-
-
72049108098
-
-
10.1088/1367-2630/11/11/115020
-
D. Dobrynin, G. Fridman, G. Friedman, and A. Fridman, New J. Phys. 11, 115020 (2009). 10.1088/1367-2630/11/11/115020
-
(2009)
New J. Phys.
, vol.11
, pp. 115020
-
-
Dobrynin, D.1
Fridman, G.2
Friedman, G.3
Fridman, A.4
-
2
-
-
72049111528
-
-
10.1088/1367-2630/11/11/115012
-
M. G. Kong, G. Kroesen, G. Morfill, T. Nosenko, T. Shimizu, J. van Dijk, and J. L. Zimmermann, New J. Phys. 11, 115012 (2009). 10.1088/1367-2630/11/11/ 115012
-
(2009)
New J. Phys.
, vol.11
, pp. 115012
-
-
Kong, M.G.1
Kroesen, G.2
Morfill, G.3
Nosenko, T.4
Shimizu, T.5
Van Dijk, J.6
Zimmermann, J.L.7
-
8
-
-
77952979668
-
-
10.1063/1.3430636
-
D. B. Kim, S. Y. Moon, H. Jung, B. Gweon, and W. Choe, Phys. Plasmas 17, 053508 (2010). 10.1063/1.3430636
-
(2010)
Phys. Plasmas
, vol.17
, pp. 053508
-
-
Kim, D.B.1
Moon, S.Y.2
Jung, H.3
Gweon, B.4
Choe, W.5
-
9
-
-
77958026343
-
-
10.1063/1.3496474
-
Y. T. Zhang, Q. Q. Li, J. Lou, and Q. M. Li, Appl. Phys. Lett. 97, 141504 (2010). 10.1063/1.3496474
-
(2010)
Appl. Phys. Lett.
, vol.97
, pp. 141504
-
-
Zhang, Y.T.1
Li, Q.Q.2
Lou, J.3
Li, Q.M.4
-
10
-
-
79954571350
-
-
10.1063/1.3573811
-
J. H. Liu, X. Y. Liu, K. Hu, D. W. Liu, X. P. Lu, F. Iza, and M. G. Kong, Appl. Phys. Lett. 98, 151502 (2011). 10.1063/1.3573811
-
(2011)
Appl. Phys. Lett.
, vol.98
, pp. 151502
-
-
Liu, J.H.1
Liu, X.Y.2
Hu, K.3
Liu, D.W.4
Lu, X.P.5
Iza, F.6
Kong, M.G.7
-
11
-
-
72049130847
-
-
10.1088/1367-2630/11/11/115024
-
D. Bayliss, J. Walsh, G. Shama, F. Iza, and M. Kong, New J. Phys. 11, 115024 (2009). 10.1088/1367-2630/11/11/115024
-
(2009)
New J. Phys.
, vol.11
, pp. 115024
-
-
Bayliss, D.1
Walsh, J.2
Shama, G.3
Iza, F.4
Kong, M.5
-
12
-
-
0000288730
-
-
10.1007/BF01380792
-
G. A. Dawson and W. P. Winn, Z. Phys. 183, 159-171 (1965). 10.1007/BF01380792
-
(1965)
Z. Phys.
, vol.183
, pp. 159-171
-
-
Dawson, G.A.1
Winn, W.P.2
-
13
-
-
77952389578
-
-
10.1063/1.3381132
-
Q. Xiong, X. P. Lu, K. Ostrikov, Y. Xian, C. Zou, Z. Xiong, and Y. Pan, Phys. Plasmas 17, 043506 (2010). 10.1063/1.3381132
-
(2010)
Phys. Plasmas
, vol.17
, pp. 043506
-
-
Xiong, Q.1
Lu, X.P.2
Ostrikov, K.3
Xian, Y.4
Zou, C.5
Xiong, Z.6
Pan, Y.7
-
14
-
-
33749343864
-
-
10.1063/1.2349475
-
X. Lu and M. Laroussi, J. Appl. Phys. 100, 063302 (2006). 10.1063/1.2349475
-
(2006)
J. Appl. Phys.
, vol.100
, pp. 063302
-
-
Lu, X.1
Laroussi, M.2
-
15
-
-
76749100220
-
-
10.1088/0022-3727/43/7/075201
-
J. L. Walsh, F. Iza, N. B. Janson, V. J. Law, and M. G. Kong, J. Phys. D: Appl. Phys. 43, 075201 (2010). 10.1088/0022-3727/43/7/075201
-
(2010)
J. Phys. D: Appl. Phys.
, vol.43
, pp. 075201
-
-
Walsh, J.L.1
Iza, F.2
Janson, N.B.3
Law, V.J.4
Kong, M.G.5
-
20
-
-
0001180613
-
-
10.1088/0022-3727/5/12/307
-
I. Gallimberti, J. Phys. D: Appl. Phys. 5, 2179-2189 (1972). 10.1088/0022-3727/5/12/307
-
(1972)
J. Phys. D: Appl. Phys.
, vol.5
, pp. 2179-2189
-
-
Gallimberti, I.1
-
21
-
-
79954531460
-
-
10.1063/1.3576940
-
G. V. Naidis, Appl. Phys. Lett. 98, 141501 (2011). 10.1063/1.3576940
-
(2011)
Appl. Phys. Lett.
, vol.98
, pp. 141501
-
-
Naidis, G.V.1
-
22
-
-
78149442126
-
-
10.1002/ppa201000049
-
D. Liu, M. Rong, X. Wang, F. Iza, M. Kong, and P. Bruggeman, Plasma Processes Polym. 7, 846-865 (2010). 10.1002/ppap.201000049
-
(2010)
Plasma Processes Polym.
, vol.7
, pp. 846-865
-
-
Liu, D.1
Rong, M.2
Wang, X.3
Iza, F.4
Kong, M.5
Bruggeman, P.6
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