Growing graphene on polycrystalline copper foils by ultra-high vacuum chemical vapor deposition

Carbon

Volumn 78, Issue , 2014, Pages 347-355

  Mueller, Niclas S ^a   Morfa, Anthony J ^a   Abou Ras, Daniel ^b   Oddone, Valerio ^a   Ciuk, Tymoteusz ^c   Giersig, Michael ^a  

^a FREIE UNIVERSITÄT BERLIN   (Germany)

^b HAHN MEITNER INSTITUT   (Germany)

^c ukasiewicz Research Network Institute of Microelectronics and Photonics   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COPPER; HYDROGEN; MONOLAYERS;

DISSOLVED HYDROGEN; GRAPHENE GROWTH; GROWTH BEHAVIOR; GROWTH MODELING; GROWTH PRESSURE; POLYCRYSTALLINE COPPER; SURFACE ORIENTATION; ULTRAHIGH VACUUM CHEMICAL VAPOR DEPOSITION;

GRAPHENE;

EID: 84906306807     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2014.07.011     Document Type: Article

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