Effect of lithiation potential and cycling on chemical and morphological evolution of si thin film electrode studied by ToF-SIMS

ACS Applied Materials and Interfaces

Volumn 6, Issue 15, 2014, Pages 13023-13033

  Pereira Nabais, Catarina ^a   Światowska, Jolanta ^a   Rosso, Michel ^b   Ozanam, François ^b   Seyeux, Antoine ^a   Gohier, Aurélien ^c   Tran Van, Pierre ^c   Cassir, Michel ^a   Marcus, Philippe ^a  

^a PSL RESEARCH UNIVERSITY   (France)

^b LABORATOIRE DE PHYSIQUE DE LA MATIÈRE CONDENSÉE   (France)

^c RENAULT   (France)

Author keywords

diffusion; Li trapping; SEI layer; Si thin film electrode; ToF SIMS; volume expansion shrinkage

Indexed keywords

CHEMICAL MODIFICATION; DIFFUSION; ELECTROCHEMICAL ELECTRODES; INTERFACES (MATERIALS); PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SECONDARY ION MASS SPECTROMETRY; SEEBECK EFFECT; SILICON; SOLID ELECTROLYTES; THIN FILMS;

APPARENT DIFFUSION COEFFICIENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS (PE CVD); SEI LAYER; SOLID ELECTROLYTE INTERPHASE LAYER (SEI); THIN-FILM ELECTRODE; TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY; TOF SIMS; VOLUME EXPANSION;

LITHIUM;

EID: 84906224681     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am502913q     Document Type: Article

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