The structural evolution and lithiation behavior of vacuum-deposited Si film with high reversible capacity

Electrochimica Acta

Volumn 53, Issue 18, 2008, Pages 5660-5664

  Zhang, T ^a   Zhang, H P ^a   Yang, L C ^a   Wang, B ^a   Wu, Y P ^a   Takamura, T ^b  

^a FUDAN UNIVERSITY   (China)

^b HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Anode; Kinetics of lithiation de lithiation; Li ion batteries; Polycrystalline silicon grains; Vacuum deposited Si film

Indexed keywords

LITHIUM BATTERIES; SHRINKAGE; SILICON COMPOUNDS; STRESS ANALYSIS; SURFACE TREATMENT; THERMAL EXPANSION; THIN FILMS; VACUUM DEPOSITION;

DE-LITHIATION; KINETICS OF LITHIATION/DE-LITHIATION; POLYCRYSTALLINE SILICON GRAINS; VACUUM-DEPOSITED SI FILM;

MICROSTRUCTURAL EVOLUTION;

EID: 43049092960     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2008.03.017     Document Type: Article

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