Properties of amorphous Si thin film anodes prepared by pulsed laser deposition

Materials Research Bulletin

Volumn 42, Issue 7, 2007, Pages 1301-1309

  Xia, Hui ^a   Tang, Songbai ^b   Lu, Li ^a,b  

^a SINGAPORE MIT ALLIANCE   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

A. Amorphous materials; A. Thin film; B. Electrochemical properties; B. Laser deposition; C. Electrochemical measurements

Indexed keywords

AMORPHOUS MATERIALS; ANODES; CURRENT DENSITY; ELECTROCHEMISTRY; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; X RAY DIFFRACTION ANALYSIS;

CONSTANT CURRENT DENSITY; GALVANOSTATIC CHARGE; LITHIUM COUNTER ELECTRODES;

THIN FILMS;

EID: 34247511225     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.materresbull.2006.10.007     Document Type: Article

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