Effect of hydrogen flow during cooling phase to achieve uniform and repeatable growth of bilayer graphene on copper foils over large area

Carbon

Volumn 77, Issue , 2014, Pages 341-350

  Gulotty, Richard ^a,b   Das, Saptarshi ^b   Liu, Yuzi ^b   Sumant, Anirudha V ^b  

^a University of California Riverside   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COPPER; ELECTRON DIFFRACTION; FIELD EFFECT TRANSISTORS; HYDROGEN;

BILAYER GRAPHENE; CHEMICAL VAPOR DEPOSITION METHODS; COOLING PHASE; EFFECT OF HYDROGEN; GRAPHENE FIELD-EFFECT TRANSISTORS; GROWTH REGIME; SELECTED-AREA ELECTRON DIFFRACTION MEASUREMENTS; VACUUM COOLING;

GRAPHENE;

EID: 84905641500     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2014.05.037     Document Type: Article

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