Evaluation of chemical kinetics in positive photoresists using laser desorption ionization

European Polymer Journal

Volumn 59, Issue , 2014, Pages 1-7

  Martins, J S ^a   Borges, B G A L ^b   Machado, R C ^a   Carpanez, A G ^a   Grazul, R M ^a   Zappa, F ^a   Melo, W S ^a   Rocco, M L M ^b   Pinho, R R ^a   Lima, C R A ^a  

^a FEDERAL UNIVERSITY OF JUIZ DE FORA   (Brazil)

^b FEDERAL UNIVERSITY OF RIO DE JANEIRO   (Brazil)

Author keywords

Dill C parameter; Mass spectrometry; Photoresist; Time of flight

Indexed keywords

ARC LAMPS; DECAY (ORGANIC); INDUCTIVELY COUPLED PLASMA; IONIZATION; KINETICS; MASS SPECTROMETERS; MASS SPECTROMETRY; MERCURY (METAL); MICROELECTRONICS; PHOTOREFRACTIVE MATERIALS; ULTRAVIOLET LASERS;

C PARAMETER; CHEMICAL KINETIC MECHANISM; LASER DESORPTION IONIZATION; PHOTOACTIVE COMPOUNDS; PHOTOSENSITIVE MATERIALS; PHYSICAL-CHEMICAL PROPERTIES; TIME OF FLIGHT; TIME-OF-FLIGHT MASS SPECTROMETERS;

PHOTORESISTS;

EID: 84905400262     PISSN: 00143057     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.eurpolymj.2014.07.005     Document Type: Article

References (24)

1. S.A. Campbell The science and engineering of microelectronic fabrication 1996 Oxford University Press
2. Jaeger RC. Introduction to microelectronic fabrication, 2a ed. Upper Saddle River, NJ: Prentice Hall; 1988. c2002.316p.
3. E. Reichmanis, F.M. Houlihan, O. Nalamasu, and T.X. Neenan Chemical amplification mechanisms for microlithography Chem Mater 3 1991 394 407
4. T. Otha Phase-change optical memory promotes the DVD optical disk J Opt Adv Mater 3 2001 609 626
5. B.M. Assunção, I.F. da Costa, C.R.A. Lima, and L. Cescato Developed profile of holographically exposure gratings recorded in photoresists Appl Opt 34 1995 597 603
6. C.R.A. Lima, and L. Cescato Mixing of the reflected waves to monitor and stabilize holographic exposures Opt Eng 35 1996 2804 2809 (Pubitemid 126679604)
7. C.R.A. Lima, L.L. Soares, and L. Cescato Reflecting polarizing beam splitter Opt Lett 22 1997 203 205 (Pubitemid 127586100)
8. L.L. Soares, C.R.A. Lima, M.A.R. Alves, E.S. Braga, and L. Cescato Diffective structures holographically recorded in amorphous hydrogenated carbon (a-C:H) films Opt Lett 22 1997 1805 1807 (Pubitemid 127600185)
9. M.S. Sthel, C.R.A. Lima, and L. Cescato Photoresist resolution measurement during the exposure process Appl Opt 30 1991 5152 5156
10. A.V. Kolobov, and J. Tominaga Chalcogenide glasses as prospective materials for optical memories and optical data storage J Mater Sci-Mater El 14 2003 677 680
11. F.H. Dill Optical lithography IEEE T Electron Dev 22 1975 440 444
12. C.A. Mack Appl Opt 27 1988 4913 4919
13. H. Ito Dissolution behavior of chemically amplified resist polymers for 248, 193 and 157 nm lithography IBM J RES DEV 45 2001 683 695 (Pubitemid 34005122)
14. A. Reiser, J.P. Huang, X. He, T.F. Yeh, S. Jha, and H.Y. Shih et al. The molecular mechanism of Novolac-diazonaphthoquinone resists Eur Polym J 38 2002 619 629
15. R.R. Dammel Diazonaphthoquinone-based resists vol. TT-11 1993 SPIE Optical Enginnering Press Bellingham, WA
16. H.J. Levinson Principles of lithography Hardcover 2005
17. L.A.V. Mendes, L.F. Avila, J.W. Menezes, R.R. Pinho, C.R.A. Lima, and L. Cescato et al. Photoresists comparative analysis using soft X-ray synchrotron radiation and time-of-flight mass spectrometry Eur Polym J 45 2009 3347 3354
18. L.A.V. Mendes, R.R. Pinho, L.F. Avila, C.R.A. Lima, and M.L.M. Rocco AZ-1518 photoresist analysis with synchrotron radiation using high-resolution time-of-flight mass spectrometry Polym Degrad Stabil 92 2007 933 938 (Pubitemid 46745312)
19. M. Karas, D. Bachmann, U. Bahr, and F. Hillenkamp Matrix - assisted ultraviolet laser desorption of non - volatile compounds Int J Mass Spectrom 78 1987 53 68
20. S.C. Goheen, K.L. Wahl, J.A. Campbell, and W.P. Hess Mass spectrometry of low molecular mass solids by matrix-assisted laser desorption/ionization J Mass Spectrom 32 1997 933 938
21. J.L. Wiza Microchannel plate detector Nucl Instrum Methods 162 1979 587 601
22. V.E. Frankevich, J. Zhang, S.D. Friess, M. Dashtiev, and R. Zenobi Role of electrons in laser desorption/ionization mass spectrometry Anal Chem 75 2003 6063 6067 (Pubitemid 37420595)
23. O. IngÓlfsson, and A.M. Wodtke Laser desorption electron attachment time-of-flight mass spectrometry: a new approach to detection of involatile compounds J Am Soc Mass Spectrom 12 12 2001 1339 1347 (Pubitemid 34552639)
24. D.Z. Bezabeh, T.M. Allen, E.M. McCauley, P.B. Kelly, and A.D. Jones Negative ion laser desorption ionization time-of-flight mass spectrometry of nitrated polycyclic aromatic hydrocarbons J Am Soc Mass Spectrom 8 1997 630 636 (Pubitemid 27229849)