Electrodeposition of al-w alloys in the Lewis acidic aluminum chloride?1-ethyl-3-methylimidazolium chloride ionic liquid

Journal of the Electrochemical Society

Volumn 161, Issue 9, 2014, Pages

  Tsuda, Tetsuya ^a   Ikeda, Yuichi ^a   Arimura, Takashi ^a   Hirogaki, Masaki ^a   Imanishi, Akihito ^a,b   Kuwabata, Susumu ^a,b   Stafford, Gery R ^c   Hussey, Charles L ^d  

^a OSAKA UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^d UNIVERSITY OF MISSISSIPPI   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOYS; ALUMINUM; ALUMINUM CHLORIDE; AMORPHOUS ALLOYS; DEPOSITS; ELECTRODEPOSITION; IONIC LIQUIDS; PITTING; TUNGSTEN ALLOYS; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION;

1-ETHYL-3-METHYLIMIDAZOLIUM CHLORIDE; ALLOY CONCENTRATION; ATOMIC FRACTIONS; ELECTRODEPOSITION CONDITIONS; METHYLIMIDAZOLIUM CHLORIDE; PITTING POTENTIAL; ROOM TEMPERATURE IONIC LIQUIDS; SUPERSATURATED SOLID SOLUTIONS;

TUNGSTEN;

EID: 84904870664     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/2.016409jes     Document Type: Article

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