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Electrochimica Acta

Volumn 47, Issue 15, 2002, Pages 2387-2397

The corrosion behavior of sputter-deposited aluminum-tungsten alloys

(4) Metikos Hukovi M a Radi, N b Grubac Z c Tonejcv, H A b

a UNIVERSITY OF ZAGREB (Croatia)

b RUDER BO KOVI INSTITUTE (Croatia)

c UNIVERSITY OF SPLIT (Croatia)

Author keywords

Al base alloys; Al W amorphous alloys; Passive films; Pitting corrosion; Sputter deposited alloys

Indexed keywords

AMORPHOUS FILMS; DEFECTS; ELECTRIC POTENTIAL; ELECTROCHEMICAL CORROSION; GLASS; HYDROCHLORIC ACID; MAGNETRONS; POLARIZATION; SAPPHIRE; SOLUTIONS; SPECTROSCOPIC ANALYSIS; SPUTTER DEPOSITION; STRESS RELAXATION; SUBSTRATES; THIN FILMS; TUNGSTEN;

IMPEDANCE SPECTROSCOPY;

ALUMINUM ALLOYS;

EID: 0037024422 PISSN: 00134686 EISSN: None Source Type: Journal
DOI: 10.1016/S0013-4686(02)00040-3 Document Type: Article

Times cited : (49)

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