Relating gloss loss to nanoscale-microscale topographical change for a polymer coating exposed to UV radiation

ACS Symposium Series

Volumn 1008, Issue , 2009, Pages 328-348

  Gu, Xiaohong ^a   Sung, Li Piin ^a   Kidah, Bouchra ^a   Oudina, Mounira ^a   Martin, David ^a   Rezig, Aziz ^a   Stanley, Debbie ^a   Jean, Jerry Y C ^b   Nguyen, Tinh ^a   Martin, Jonathan W ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b UNIVERSITY OF MISSOURI KANSAS CITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; NANOTECHNOLOGY; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

GLOSS RETENTION; LASER SCANNING CONFOCAL MICROSCOPY; LOGARITHMIC SCALE; MORPHOLOGICAL CHANGES; OPTICAL SCATTERING; POLYMER COATING; ROOT MEAN SQUARE ROUGHNESS; TOPOGRAPHICAL CHANGES;

PLASTIC COATINGS;

EID: 84904817447     PISSN: 00976156     EISSN: 19475918     Source Type: Book Series    
DOI: 10.1021/bk-2009-1008.ch016     Document Type: Conference Paper

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