Multicolor and erasable DNA photolithography

ACS Nano

Volumn 8, Issue 7, 2014, Pages 6849-6855

  Huang, Fujian ^a   Xu, Huaguo ^a   Tan, Weihong ^c,d   Liang, Haojun ^a,b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^c University of Florida   (United States)

^d HUNAN UNIVERSITY   (China)

Author keywords

asymmetrical modification; colloidal particles; DNA photolithography; photocleavage; surface patterning; toehold mediated DNA strand displacement

Indexed keywords

BIOCHIPS; COLLOIDS; PHOTOLITHOGRAPHY; SUBSTITUTION REACTIONS;

ASYMMETRICAL MODIFICATION; COLLOIDAL PARTICLE; DNA STRAND DISPLACEMENTS; PHOTOCLEAVAGES; SURFACE PATTERNING;

DNA;

DNA;

CHEMICAL STRUCTURE; CHEMISTRY; COLOR; CONFORMATION; MICROTECHNOLOGY; PHOTOCHEMISTRY; PROCEDURES; ULTRAVIOLET RADIATION;

COLOR; DNA; MICROTECHNOLOGY; MODELS, MOLECULAR; NUCLEIC ACID CONFORMATION; PHOTOCHEMICAL PROCESSES; ULTRAVIOLET RAYS;

EID: 84904725765     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn5024472     Document Type: Article

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