Cost-effective systems for atomic layer deposition

Journal of Chemical Education

Volumn 91, Issue 7, 2014, Pages 1022-1027

  Lubitz, Michael ^a,b   Medina, Phillip A ^b   Antic, Aleks ^b   Rosin, Joseph T ^b   Fahlman, Bradley D ^b  

^a BASF CORPORATION   (United States)

^b CENTRAL MICHIGAN UNIVERSITY   (United States)

Author keywords

Analytical Chemistry; Chemical Engineering; Graduate Education Research; Hands On Learning Manipulatives; Interdisciplinary Multidisciplinary; Laboratory Equipment Apparatus; Laboratory Instruction; Materials Science; Upper Division Undergraduate

Indexed keywords

EID: 84904106750     PISSN: 00219584     EISSN: 19381328     Source Type: Journal    
DOI: 10.1021/ed4007698     Document Type: Article

References (8)

1. Fahlman, B. D. Materials Chemistry, 2 nd ed.; Springer: New York, 2011.
2. George, S. M. Atomic Layer Deposition: A Review Chem. Rev. 2010, 110, 111-131
3. Hamalainen, J.; Ritala, M.; Leskela, M. Atomic Layer Deposition of Noble Metals and Their Oxides Chem. Mater. 2014, 26, 786
4. Ahmed, W.; Sein, H.; Rajab, H.; Jackson, M. Chemical Vapor Deposition of Diamond Coatings onto Dental Burrs J. Chem. Educ. 2003, 80, 636-641
5. Vohs, J. K.; Bentz, A.; Eleamos, K.; Poole, J.; Fahlman, B. D. Chemical Vapor Deposition of Aluminum Oxide Thin Films J. Chem. Educ. 2010, 87, 1102-1104
6. Fahlman, B. D. Chemical Vapor Deposition of Carbon Nanotubes: An Experiment in Materials Chemistry J. Chem. Educ. 2002, 79, 203-206
7. For ALD systems at the lower end of pricing, see: http://www. cambridgenanotechald.com (accessed May 2014).
8. National Nanotechnology Infrastructure Network. http://nnin.org (a NSF-funded initiative to provide low-cost options for fabrication and characterization of nanomaterials for institutions without suitable equipment) (accessed May 2014).