Intrinsic energy band alignment of functional oxides

Physica Status Solidi - Rapid Research Letters

Volumn 8, Issue 6, 2014, Pages 571-576

  Li, Shunyi ^a   Chen, Feng ^a   Schafranek, Robert ^a   Bayer, Thorsten J M ^a   Rachut, Karsten ^a   Fuchs, Anne ^a   Siol, Sebastian ^a   Weidner, Mirko ^a   Hohmann, Mareike ^a   Pfeifer, Verena ^a   Morasch, Jan ^a   Ghinea, Cosmina ^a   Arveux, Emmanuel ^a   Günzler, Richard ^a   Gassmann, Jürgen ^a   Körber, Christoph ^a   Gassenbauer, Yvonne ^a   Säuberlich, Frank ^a   Rao, Gutlapalli Venkata ^a   Payan, Sandrine ^b   Maglione, Mario ^b   Chirila, Cristina ^c   Pintilie, Lucian ^c   Jia, Lichao ^d   Ellmer, Klaus ^d   Naderer, Michael ^e   Reichmann, Klaus ^e   Böttger, Ulrich ^f   Schmelzer, Sebastian ^f   Frunza, Raluca C ^g   Uršič, Hana ^g   Malič, Barbara ^g   Wu, Wen Bin ^h   Erhart, Paul ⁱ   Klein, Andreas ^a   more..

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^b UNIVERSITÉ DE BORDEAUX   (France)

^c NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

^d HAHN MEITNER INSTITUT   (Germany)

^e GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

^f RWTH AACHEN UNIVERSITY   (Germany)

^g JO EF STEFAN INSTITUTE   (Slovenia)

^h UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

ⁱ CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

Electronic structure; Energy band alignment; Functional oxides; Photoelectron spectroscopy; Transitivity

Indexed keywords

BAND STRUCTURE; ELECTRONIC STRUCTURE; INTERFACES (MATERIALS); PHOTOELECTRON SPECTROSCOPY;

ENERGY-BAND ALIGNMENT; FUNCTIONAL OXIDES; ORBITAL CONTRIBUTION; PHOTO-ELECTROCHEMISTRY; TRANSITIVITY; UNDERLYING PRINCIPLES; VALENCE BAND OFFSETS; VALENCE-BAND MAXIMUM ENERGY;

ALIGNMENT;

EID: 84902689255     PISSN: 18626254     EISSN: 18626270     Source Type: Journal    
DOI: 10.1002/pssr.201409034     Document Type: Article

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