Optical properties of nanocrystalline WO3 and WO3-x thin films prepared by DC magnetron sputtering

Journal of Applied Physics

Volumn 115, Issue 21, 2014, Pages

  Johansson, Malin B ^a   Zietz, Burkhard ^a   Niklasson, Gunnar A ^a   Österlund, Lars ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

EMISSION SPECTROSCOPY; MAGNETRON SPUTTERING; OPTICAL TRANSITIONS; OXYGEN VACANCIES; THIN FILMS; TUNGSTEN;

DC MAGNETRON SPUTTERING; DOMINANT CONTRIBUTIONS; LOW-ENERGY EMISSION; NEAR INFRARED REGION; OPTICAL TRANSITION ENERGIES; PHOTOLUMINESCENCE EMISSION; POLARON ABSORPTION; TUNGSTEN TRIOXIDE THIN FILM;

FILM PREPARATION;

EID: 84902596793     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.4880162     Document Type: Article

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