Structural and optical properties of visible active photocatalytic WO 3 thin films prepared by reactive dc magnetron sputtering

Journal of Materials Research

Volumn 27, Issue 24, 2012, Pages 3130-3140

  Johansson, M B ^a   Niklasson, G A ^a   Osterlund L ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

AFFINITY LEVEL; BANDGAP STATE; MONOCLINIC STRUCTURES; NANO-STRUCTURED; NEAR INFRARED REGION; PHOTO-CATALYTIC; PHOTO-EXCITATIONS; PHOTODEGRADATION RATE; PHOTOEXCITED ELECTRON-HOLE PAIRS; PHOTON ENERGY; POLARON ABSORPTION; REACTIVE DC MAGNETRON SPUTTERING; RECOMBINATION MECHANISMS; STRAINED FILMS; STRUCTURAL AND OPTICAL PROPERTIES; TUNGSTEN TRIOXIDE; ULTRAVIOLET-VISIBLE SPECTROPHOTOMETRY; URBACH TAIL; WORKING PRESSURES;

ENERGY GAP; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; PHOTOEXCITATION; POLARONS; QUANTUM YIELD; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; STEARIC ACID; STOICHIOMETRY; TUNGSTEN; X RAY DIFFRACTION;

FILM PREPARATION;

EID: 84871388418     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/jmr.2012.384     Document Type: Article

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