Study of high-tech process furnace using inherently safer design strategies (I) temperature distribution model and process effect

Journal of Loss Prevention in the Process Industries

Volumn 26, Issue 6, 2013, Pages 1198-1211

  Chen, Chun Yu ^a   Chang, Kuo Chi ^b   Wang, Gwo Bin ^c  

^a VANUNG UNIVERSITY   (Taiwan)

^b NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY   (Taiwan)

^c CHANG GUNG UNIVERSITY   (Taiwan)

Author keywords

Attenuation; Distribution; Inherently safer design; Intensification; Limitation of effects; LPCVD furnace; Thermal model of wafer temperature

Indexed keywords

ACCIDENTS; ECONOMICS; FURNACES; LIQUID CRYSTAL DISPLAYS; MACHINERY; MANUFACTURE; MATERIALS HANDLING; OUTAGES; SENSITIVITY ANALYSIS; SUPPLY CHAINS; TEMPERATURE CONTROL; TEMPERATURE DISTRIBUTION;

ATTENUATION; DISTRIBUTION; INHERENTLY SAFER DESIGN; INTENSIFICATION; LIMITATION OF EFFECTS; WAFER TEMPERATURE;

THIN FILM TRANSISTORS;

EID: 84901693359     PISSN: 09504230     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jlp.2013.05.006     Document Type: Article

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