Theoretical analysis of wafer temperature dynamics in a low pressure chemical vapor deposition reactor

International Journal of Heat and Mass Transfer

Volumn 42, Issue 22, 1999, Pages 4131-4142

  Kim, Il Kyoung ^a   Kim, Woo Seung ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; NUMERICAL ANALYSIS; SILICON WAFERS; TEMPERATURE; TEMPERATURE DISTRIBUTION;

DIFFUSE REFLECTION; LOW PRESSURE CHEMICAL VAPOR DEPOSITION REACTOR; TEMPERATURE VARIATIONS;

THERMOANALYSIS;

FILM; REACTOR; SEMICONDUCTOR; TEMPERATURE DISTRIBUTION; VAPOR DEPOSITION;

EID: 0032880277     PISSN: 00179310     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0017-9310(99)00069-1     Document Type: Article

References (14)

1. Rosler R.S. Low pressure CVD processes for poly, nitride, and oxide. Solid State Technology. 20:1977;63-70.
2. Sze S.M. VLSI Technology. 1988;McGraw-Hill, New York.
3. Sato T. Spectral emissivity of silicon. Japanese Journal of Applied Physics. 6:1967;339-347.
4. Hu S.M. Temperature distribution and stresses in circular wafers in a row during radiative cooling. Journal of Applied Physics. 40:1969;4413-4423.
5. Van Schravendijk B.J., De Koning W.L. Modeling and control of the wafer temperatures in a diffusion furnace. Journal of Applied Physics. 61:1987;1620-1627.
6. De Waard H., De Koning W.L. Optimal control of the wafer temperatures in diffusion/LPCVD reactors. Automatica. 28:1992;243-253.
7. Badgwell T.A., Trachtenberg I., Edgar T.F. Modeling the wafer temperature profile in a multiwafer LPCVD furnace. Journal of Electrochemical Society. 141:1994;161-172.
8. Bird R., Stewart W., Lightfoot E. Transport Phenomena. 1960;John Wiley and Sons, New York.
9. Hoffmann K.A., Chiang S.T. Computational Fluid Dynamics for Engineers, A Publication of Engineering Education System. 1993.
10. Ozisik M.N. Radiative Transfer and Interactions with Conduction and Convection. 1973;John Wiley and Sons, New York.
11. Modest M.F. Radiation Heat Transfer. 1993;McGraw-Hill.
12. Siegel R., Howell J.R. Thermal Radiation Heat Transfer. 1982;McGraw-Hill, New York.
13. Howell J.R. Radiation Configuration Factor. 1982;McGraw-Hill, New York.
14. Sparrow E.M., Cess R.D. Radiation Heat Transfer. 1976;McGraw-Hill, New York.