Analysis of radiative heat transfer and mass transfer during multiwafer low-pressure chemical vapor deposition

Journal of the Electrochemical Society

Volumn 147, Issue 12, 2000, Pages 4554-4561

  Park, K S ^a,b   Choi, M ^a,c   Cho, H J ^a,c   Chung, J D ^a,c  

^a Seoul National University   (South Korea)

^b LG   (South Korea)

^c Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION (PROCESS); HEAT TRANSFER; MASS TRANSFER; RADIATION; THERMAL EFFECTS;

GROWTH RATE; HEATER; LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD); QUARTZ TUBE; SURFACE RADIATION ANALYSIS;

CHEMICAL VAPOR DEPOSITION;

EID: 0034511494     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1394100     Document Type: Article

References (20)

1. S. Hirasawa, T. Torii, and T. Takagaki, in National Heat Transfer Conferenee Proceedings. HTD-113, 77 (1989).
2. T. A. Badgwell, I. Trachtenherg, and T. F. Edgar, J. Electrochem. Soc., 141, 161 (1994).
3. W. G. Houf, J. F. Grear, and W. G. Breiland. Mater. Sci. Eng. B, 17, 163 (1993).
4. D. G. Coronell and K. F. Jensen, J. Electrochem. Soc., 141, 496 (1994).
5. I.-K. Kim and W.-S. Kim, Int. J. Heat Mass Transfer, 42, 4131 (1999).
6. P. Duverneuil and J.-P. Coudere, J. Electrochem. Soc. 139, 296 (1992).
7. C. Azzaro, P. Duverneuil, and J.-P. Couderce, J. Electrochem. Soc., 139, 305 (1992).
8. T. A. Badgwell, T. F. Edgar, I. Trachtenberg, and J. K. Elliott, J. Electrochem. Soc. 139, 524(1992).
9. R. Siegel and J. R. Howell, Thermal Radiation Heat Transfer, 3rd ed., Hemisphere, Washington, DC (1992).
10. K. S. Park and M. Choi, ASME J. Heat Transfer. 120, 858 (1998).
11. K. S. Park, Ph.D. Thesis, Seoul National University, Seoul, Korea (1997).
12. F. P. Incropera and D. P. Dewitt. Fundamentals of Heat and Mass Transfer, John Wiley & Sons, Inc., New York (1996).
13. C. F. Curtiss and J. O. Hirschfelder, J. Chem. Phys., 17, 550 (1949).
14. D. E. Rosner, Transport Process in Chemically Reacting Flow Systems, Butterworth, Washington, DC (1986).
15. K. F. Roenigk and K. F. Jensen, J. Electrochem. Soc., 132, 448 (1985).
16. S. V. Patankar, Numerical Heat Transfer and Fluid Flow. Hemisphere, Washington, DC. (1980).
17. D. W. Peaceman and H. H. Rachford, J. Soc. Ind. Appl. Math., 3, 28 (1955).
18. T. A. Badgwell, T. F. Edgar, I. Trachtenberg, G. Yelter, J. K. Elliot, and R. L. Anderson, IEEE Trans. Semi. Manuf., 6, 65 (1993).
19. W. G. Houf, J. F. Grcar, and W. G. Breiland, in Proceedingss of the 12th International Symposium on Chemical Vapor Deposition, K. F. Jensen and G. W. Cullen, Editors, PV 93-2, p. 85. The Electrochemical Society Proceedings Series, Pennington, NJ (1993).
20. K. F. Jensen and D. B. Graves, J. Electrochem. Soc., 130, 1950 (1983).