Phononic engineering of silicon using "dots on the fly" e-beam lithography and plasma etching

Microelectronic Engineering

Volumn 121, Issue , 2014, Pages 131-134

  Lacatena, V ^a,b   Haras, M ^a,b   Robillard, J F ^b   Monfray, S ^a   Skotnicki, T ^a   Dubois, E ^b  

^a STMICROELECTRONICS   (France)

^b INSTITUT D ELECTRONIQUE   (France)

Author keywords

E beam Lithography; Phononics; Plasma etching; Thermoelectricity

Indexed keywords

ELECTRIC POWER FACTOR; ELECTRON BEAM LITHOGRAPHY; PHONONS; PLASMA ETCHING; THERMOELECTRICITY;

ANISOTROPIC PLASMA ETCHING; CONVENTIONAL TECHNIQUES; DIFFERENT LENGTH SCALE; E-BEAM LITHOGRAPHY; ELECTRICAL CONDUCTIVITY; LATTICE THERMAL CONDUCTIVITY; PHONONICS; THERMAL CONDUCTIVITY REDUCTIONS;

THERMAL CONDUCTIVITY;

EID: 84901047739     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2014.04.034     Document Type: Article

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