Reduced graphene oxide thin films as ultrabarriers for organic electronics

Advanced Energy Materials

Volumn 4, Issue 4, 2014, Pages

  Yamaguchi, Hisato ^a   Granstrom, Jimmy ^c   Nie, Wanyi ^b   Sojoudi, Hossein ^c,e   Fujita, Takeshi ^d   Voiry, Damien ^a   Chen, Mingwei ^d   Gupta, Gautam ^b   Mohite, Aditya D ^b   Graham, Samuel ^c   Chhowalla, Manish ^a  

^a The State University of New Jersey   (United States)

^b LOS ALAMOS NATIONAL LABORATORY   (United States)

^c GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^d TOHOKU UNIVERSITY   (Japan)

^e Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

gas barrier; graphene oxide; organic electronics; solution processing

Indexed keywords

ATMOSPHERIC CONDITIONS; GAS BARRIER; GRAPHENE OXIDES; ORGANIC ELECTRONICS; POLY-3-HEXYLTHIOPHENE; REDUCED GRAPHENE OXIDES; REDUCED GRAPHENE OXIDES (RGO); SOLUTION-PROCESSING;

ATOMIC FORCE MICROSCOPY; COMPOSITE FILMS; GRAPHENE; PHOTOELECTRONS; TRANSMISSION ELECTRON MICROSCOPY; VAPORS; X RAY PHOTOELECTRON SPECTROSCOPY;

GAS PERMEABLE MEMBRANES;

EID: 84900634238     PISSN: 16146832     EISSN: 16146840     Source Type: Journal    
DOI: 10.1002/aenm.201300986     Document Type: Article

References (34)

1. G. L. Graff, R. E. Williford, P. E. Burrows, J. Appl. Phys. 2004, 96, 1840.
2. J. Meyer, P. Gorrn, F. Bertram, S. Hamwi, T. Winkler, H. H. Johannes, T. Weimann, P. Hinze, T. Riedl, W. Kowalsky, Adv. Mater. 2009, 21, 1845.
3. N. Kim, W. J. Potscavage, B. Domercq, B. Kippelen, S. Graham, Appl. Phys. Lett. 2009, 163308.
4. J. D. Affinito, M. E. Gross, C. A. Coronado, G. L. Graff, E. N. Greenwell, P. M. Martin, Thin Solid Films 1996, 6, 290.
5. J. S. Bunch, S. S. Verbridge, J. S. Alden, A. M. van der Zande, J. M. Parpia, H. G. Craighead, P. L. McEuen, Nano Lett. 2008, 8, 2458.
6. A. Kolmakov, D. A. Dikin, L. J. Cote, J. Huang, M. K. Abyaneh, M. Amati, L. Gregoratti, S. Günther, M. Kiskinova, Nat. Nanotechnol. 2011, 6, 651.
7. S. P. Koenig, L. Wang, J. Pellegrino, J. S. Bunch, Nat. Nanotechnol. 2012, 7, 728.
8. K. S. Novoselov, V. I. Falko, L. Colombo, P. R. Gellert, M. G. Schwab, K. Kim, Nature 2012, 490, 192.
9. O. Leenaerts, B. Partoens, F. M. Peeters, Appl. Phys. Lett. 2008, 93, 193105.
10. S. Chen, L. Brown, M. Levendorf, W. Cai, S.-Y. Ju, J. Edgeworth, X. Li, C. W. Magnuson, A. Velamakanni, R. D. Piner, J. Kang, J. Park, R. S. Ruoff, ACS Nano 2011, 1321.
11. M. Schriver, W. Regan, W. J. Gannett, A. M. Zaniewski, M. F. Crommie, A. Zettl, ACS Nano 2013, 7, 5763.
12. Z. Liu, J. Li, F. Yan, Adv. Mater. 2013, 25, 4296.
13. W. S. Hummers, R. E. Offeman, J. Am. Chem. Soc. 1958, 80, 1339.
14. M. Hirata, T. Gotou, S. Horiuchi, M. Fujiwara, M. Ohba, Carbon 2004, 42, 2929.
15. S. Stankovich, D. A. Dikin, G. H. B. Dommett, K. M. Kohlhaas, E. J. Zimney, E. A. Stach, R. D. Piner, S. T. Nguyen, R. S. Ruoff, Nature 2006, 442, 282.
16. G. Eda, M. Chhowalla, Adv. Mater. 2010, 22, 2392.
17. A. Bagri, C. Mattevi, M. Acik, Y. J. Chabal, M. Chhowalla, V. B. Shenoy, Nat. Chem. 2010, 2, 581.
18. G. Eda, G. Fanchini, M. Chhowalla, Nat. Nanotechnol. 2008, 3, 270.
19. J. T. Robinson, M. Zalalutdinov, J. W. Baldwin, E. S. Snow, Z. Wei, P. Sheehan, B. H. Houston, Nano Lett. 2008, 8, 3441.
20. H. Yamaguchi, G. Eda, C. Mattevi, H. Kim, M. Chhowalla, ACS Nano 2010, 4, 524.
21. O. C. Compton, S. Kim, C. Pierre, J. M. Torkelson, S. T. Nguyen, Adv. Mater. 2010, 22, 4759.
22. H. Kim, Y. Miura, C. W. Macosko, Chem. Mat. 2010, 22, 3441.
23. Y.-H. Yang, L. Bolling, Morgan A. Priolo, J. C. Grunlan, Adv. Mater. 2013, 25, 493.
24. M. Manceau, A. Rivaton, J. L. Gardette, S. Guillerez, N. Lemaitre, Polym. Degrad. Stabil. 2009, 94, 898.
25. M. Manceau, S. Chambon, A. Rivaton, J. L. Gardette, S. Guillerez, N. Lemaitre, Sol. Energy Mater. Sol. Cells 2010, 94, 1572.
26. L. J. Cote, R. Cruz-Silva, J. Huang, J. Am. Chem. Soc. 2009, 131, 11027.
27. J. Granstrom, J. S. Swensen, J. S. Moon, G. Rowell, J. Yuen, A. J. Heeger, Appl. Phys. Lett. 2008, 93, 193304.
28. P. Matyba, H. Yamaguchi, M. Chhowalla, N. D. Robinson, L. Edman, ACS Nano 2011, 5, 574.
29. Cytop catalog, AGC Chemicals, Asahi Glass Co., Ltd., Tokyo, Japan, January, 2009.
30. M. Acik, C. Mattevi, C. Gong, G. Lee, K. Cho, M. Chhowalla, Y. J. Chabal, ACS Nano 2010, 4, 5861.
31. C. Mattevi, G. Eda, S. Agnoli, S. Miller, K. A. Mkhoyan, O. Celik, D. Mastrogiovanni, G. Granozzi, E. Garfunkel, M. Chhowalla, Adv. Funct. Mater. 2009, 19, 2577.
32. K. Erickson, R. Erni, Z. Lee, N. Alem, W. Gannett, A. Zettl, Adv Mater. 2010, 22, 4467.
33. R. R. Nair, H. A. Wu, P. N. Jayaram, I. V. Grigorieva, A. K. Geim, Science 2012, 335, 442.
34. C. J. Brabec, S. Gowrisanker, J. J.M. Halls, D. Laird, S. Jia, S. P. Williams, Adv. Mater. 2010, 22, 3839.