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Journal of Materials Chemistry A

Volumn 2, Issue 21, 2014, Pages 8094-8102

Hydrophilically patterned superhydrophobic cotton fabrics and their use in ink printing

(5) Wang, Yu a Li, Xiaoyu a Hu, Heng a Liu, Guojun a Rabnawaz, Muhammad a

a QUEEN S UNIVERSITY (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMERS; COTTON; COTTON FABRICS; DICHLOROMETHANE; HYDROPHILICITY; HYDROPHOBICITY; MASKS; MICROCHANNELS; PHOTOELECTRONS; RESERVOIRS (WATER); TEXTILE PRINTING; X RAY PHOTOELECTRON SPECTROSCOPY;

CROSSLINKED COPOLYMERS; DICHLOROMETHANE EXTRACTION; HYDROPHILIC REGIONS; LITHOGRAPHIC MASK; MICELLAR SOLUTION; SOLVENT EVAPORATION; TETRA-HYDROFURAN; WATER-BASED SOLUTIONS;

PLASTIC COATINGS;

COATINGS; COPOLYMERS; COTTON; DICHLOROMETHANE; ESCA; FABRIC; PHOTOELECTRONS; PLASTICS; RESERVOIRS; WATER REPELLENCE; X RAY SPECTROSCOPY;

EID: 84899866561 PISSN: 20507488 EISSN: 20507496 Source Type: Journal
DOI: 10.1039/c4ta00714j Document Type: Article

Times cited : (69)

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