High throughput production of nanocomposite SiOx powders by plasma spray physical vapor deposition for negative electrode of lithium ion batteries

Science and Technology of Advanced Materials

Volumn 15, Issue 2, 2014, Pages

  Homma, Keiichiro ^a   Kambara, Makoto ^a   Yoshida, Toyonobu ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

anode; lithium ion battery; nanoparticle; plasma spray; silicon

Indexed keywords

ANODES; DEPOSITION; LITHIUM BATTERIES; LITHIUM COMPOUNDS; NANOCOMPOSITES; NANOPARTICLES; PHYSICAL VAPOR DEPOSITION; PLASMA JETS; PLASMA SPRAYING; POWDERS; SILICON; SILICON CARBIDE; VAPORS;

DISPROPORTIONATION REACTIONS; HIGH TEMPERATURE; HIGH THROUGHPUT; INITIAL EFFICIENCY; IRREVERSIBLE CAPACITY; LITHIUM-ION BATTERY; NEGATIVE ELECTRODE; SHELL THICKNESS;

SILICON OXIDES;

EID: 84899754358     PISSN: 14686996     EISSN: None     Source Type: Journal    
DOI: 10.1088/1468-6996/15/2/025006     Document Type: Article

References (27)

1. Liu X H, Zhong L, Huang S, Mao S X, Zhu T and Huang J Y 2012 ACS Nano 6 1522-31
2. Graetz J, Ahn C C, Yazami R and Fultz B 2003 Electrochem. Solid-State Lett. 6 A194-7
3. Chan C K, Peng H, Liu G, McIlwrath K, Zhang X F, Huggins R A and Cui Y 2008 Nat. Nanotechnology 3 31-5
4. Magasinski A, Dixon P, Hertzberg B, Kvit A, Ayala J and Yushin G 2010 Nat. Mater. 9 353-8
5. Ng S-H, Wang J, Wexler D, Konstantinov K, Guo Z-P and Liu H-K 2006 Angew. Chem. Int. Ed. 45 6896-9
6. Doh C-H, Shin H-M, Kim D-H, Ha Y-C, Jin B-S, Kim H-S, moon S-I and Veluchamy A 2008 Electrochem. Commun. 10 233-7
7. Mamiya M, Takei H, Kikuchi M and Uyeda C 2001 J. Cryst. Growth 229 457-61
8. Wang J, Wang X F, Li Q, Hryciw A and Meldrum A 2007 Philos. Mag. 87 11-27
9. Park C-M, Choi W, Hwa Y, Kim J-H, Jeong G and Sohn H-J 2010 J. Mater. Chem. 20 4854-60
10. Kim J-H, Sohn H-J, Kim H, Jeong G and Choi W 2007 J. Power Sources 170 456-9
11. Miyachi M, Yamamoto H, Kawai H, Ohta T and Shirakata M 2005 J. Electrochem. Soc. 152 A2089-91
12. Kambara M, Hideshima T, Homma K, Kaga M, Sheem K-Y, Ishida S and Yoshida T 2014 J. Appl. Phys. 115 143302
13. Yoshida T 1994 Pure Appl. Chem. 66 1223-30
14. Bibikov M B, Demkin S A, Zhivotov V K, Zaitsev S A, Moskovskii A S, Smirnov R V and Fateev V N 2010 High Energy Chem. 44 58-62
15. Coldwell D M and Roques R A 1977 J. Electrochem. Soc. 124 168-9
16. Huczko A and Meubus P 1989 Plasma Chem. Plasma Process 9 371-86
17. Mexmain J M, Morvan D, Bourdin E, Amouroux J and Fauchais P 1983 Plasma Chem. Plasma Process 3 393-420
18. Schnurre S M, Grobner J and Schmid-Fetzer R 2004 J. Non-Cryst. Solids 336 1-25
19. Ferguson F T and Nuth J A III 2008 J. Chem. Eng. Data 53 2824-32
20. Margrave J L 1967 The Characterization of High-Temperature Vapors (New York: Wiley)
21. Takamura Y, Hayashi K, Terashima K and Yoshida T 1996 Plasma Chem. Plasma Process 16 S141-56
22. Huang H, Eguchi K, Kambara M and Yoshida T 2006 J. Thermal Spray Technol. 15 83-91
23. Young R A 1993 The Rietveld Method (Oxford: Oxford University Press)
24. Weast R C (ed) 1992 Handbook of Chemistry and Physics 73rd edn (Boca Raton, FL: CRC)
25. Kang K, Lee H-S, Han D-W, Kim G-S, Lee D, Lee G, Kang Y M and Jo M H 2010 Appl. Phys. Lett. 96 053110
26. Kaga M, Hideshima T and Kambara M 2014 JPS Conf. Proc. 1 015073
27. Kambara M, Oda N and Homma K 2014 submitted