The role of radicals and clusters in thermal plasma flash evaporation processing

Plasma Chemistry and Plasma Processing

Volumn 16, Issue 1, 1995, Pages S141-S156

  Takamura, Y ^a   Hayasaki, K ^a   Terashima, K ^a   Yoshida, T ^a  

^a UNIVERSITY OF TOKYO   (Japan)

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EID: 0030546866     PISSN: 02724324     EISSN: 15728986     Source Type: Journal    
DOI: 10.1007/BF01512632     Document Type: Article

References (22)