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Volumn 23, Issue 2, 2014, Pages 424-427

Multi-height precision alignment with selectively developed alignment marks

Author keywords

alignment; lithography; microelectromechanical systems; Microfabrication; microfluidics

Indexed keywords

ELECTROMECHANICAL DEVICES; LITHOGRAPHY; MEMS; MICROFABRICATION; MICROFLUIDICS; PHOTORESISTS;

EID: 84898494316     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2013.2279231     Document Type: Article
Times cited : (10)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.