Electroless deposition of metal nanoparticle clusters: Effect of pattern distance

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 32, Issue 3, 2014, Pages

  Gentile, Francesco ^a,b   Laura Coluccio, Maria ^a   Candeloro, Patrizio ^a   Barberio, Marianna ^c   Perozziello, Gerardo ^a   Francardi, Marco ^d   Di Fabrizio, Enzo ^a,d  

^a UNIVERSITY MAGNA GRAECIA OF CATANZARO   (Italy)

^b ISTITUTO ITALIANO DI TECNOLOGIA   (Italy)

^c UNIVERSITY OF CALABRIA   (Italy)

^d KING ABDULLAH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Saudi Arabia)

Author keywords

[No Author keywords available]

Indexed keywords

CORRELATION DISTANCE; DEPOSITION TECHNIQUE; DIFFUSION LIMITED AGGREGATION MODEL; ELECTROLESS FORMATION; NANOPARTICLE CLUSTERS; SILICON SURFACES; SINGLE-MOLECULE DETECTION; SURFACE ENHANCED RAMAN SPECTROSCOPY;

AGGREGATES; ATOMS; DEPOSITION; ELECTROLESS PLATING; ELECTROMAGNETIC FIELDS; ELECTRON BEAM LITHOGRAPHY; INTERFERENCE SUPPRESSION; METAL IONS; METAL NANOPARTICLES; RAMAN SPECTROSCOPY; SUBSTRATES;

AGGLOMERATION;

EID: 84898075836     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4870058     Document Type: Article

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