Electroless deposition dynamics of silver nanoparticles clusters: A diffusion limited aggregation (DLA) approach

Microelectronic Engineering

Volumn 98, Issue , 2012, Pages 359-362

  Gentile, F ^a,b   Coluccio, M L ^a,b   Toma, A ^b   Rondanina, E ^b   Leoncini, M ^b   De Angelis, F ^b   Das, G ^b   Dorigoni, C ^b   Candeloro, P ^a   Di Fabrizio, E ^a,b  

^a UNIVERSITY MAGNA GRAECIA OF CATANZARO   (Italy)

^b ISTITUTO ITALIANO DI TECNOLOGIA   (Italy)

Author keywords

DLA; Electroless growth; SERS

Indexed keywords

AFM IMAGING; CHARACTERISTIC LENGTH; DIFFUSION LIMITED AGGREGATION; DLA; DRIVING FORCES; ELECTROLESS; ELECTROLESS TECHNIQUE; METAL SURFACES; NANO METER RANGE; QUANTITATIVE MEASUREMENT; SERS; SERS SUBSTRATE; SILVER NANOPARTICLES; SIZE DEPENDENT; SPACE-FREQUENCY;

AGGREGATES; DIFFUSION; DYNAMICS; FRACTAL DIMENSION; MATHEMATICAL MODELS; NANOPARTICLES; SILVER; SUBSTRATES;

AGGLOMERATION;

EID: 84865599244     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2012.07.041     Document Type: Conference Paper

References (21)

1. E.M. Posasadas Annals of oncology 16 2005 16 22
2. De Angelis F. et al., Nature Photonics 5 (2011) 682.
3. L.A. Liotta, M. Ferrari, and E. Petricoin Nature 425 6961 2003 905
4. G. Das BioSensonsors and BioElectronics 24 2009 1693 1699
5. F. Gentile Microelectronic Engineering 87 2010 798 801
6. F. Gentile ACS Applied Materials and Interfaces 4 6 2012 3213 3224
7. M.L. Coluccio Microelectronic Engineering 86 2009 1085 1088
8. T. Qiu, and P.K. Chu Materials Science and Engineering R 61 2008 59 77
9. T. Qiu Applied Physics A 81 2005 669 671
10. T.A. Witten Physical Review Letters 47 12 1981 1400 1403
11. T.A. Witten, and L.M. Sander Physical Review B 27 9 1983 5686 5697
12. F. Gentile Biomaterials 31 28 2010 7205 7212
13. F. Gentile Microelectronic Engineering 88 2011 2537 2540
14. M.W. Saltzmann, Drug Delivery, Oxford University Press, 2001.
15. Gentile F., Ferrari M., Decuzzi P., Annals of, Biomedical Engineering 5 2008 2(36) 254-261.
16. F.H. Stillinger, and S. Torquato Journal of Physical Chemistry B 108 51 2004 19589 19594
17. L. Vaccari Microelectronic Engineering 83 2006 1598 1601
18. F. Perennes Journal of Micromechanics and Microengineering 16 3 2006 473 479
19. A.A. Yu Journal of the American Chemical Society 127 48 2005 16774 16775
20. M. Tormen Microelectronic Engineering 73 2004 535 541
21. P. Candeloro et al. Analyst DOI: 10.1039/c1an15313g.