Fractal structure can explain the increased hydrophobicity of nanoporous silicon films

Microelectronic Engineering

Volumn 88, Issue 8, 2011, Pages 2537-2540

  Gentile, F ^a,b   Battista, E ^a   Accardo, A ^a,b,c   Coluccio, M L ^a,b   Asande, M ^b   Perozziello, G ^b   Das, G ^a   Liberale, C ^a   De Angelis, F ^a   Candeloro, P ^b   Decuzzi, P ^b,d   Di Fabrizio, E ^a,b  

^a ISTITUTO ITALIANO DI TECNOLOGIA   (Italy)

^b UNIVERSITY MAGNA GRAECIA OF CATANZARO   (Italy)

^c EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^d HOUSTON METHODIST RESEARCH INSTITUTE   (United States)

Author keywords

Fractal surfaces; Nanoporous silicon; Superhydrophobic surfaces

Indexed keywords

ACCURATE MEASUREMENT; ANODIC DISSOLUTION; APPARENT CONTACT ANGLE; EUCLIDEAN DIMENSIONS; FRACTAL STRUCTURES; FRACTAL SURFACES; NANO-POROUS SILICON; NANOPOROUS SILICON FILMS; POROUS LAYERS; SCALE FACTOR; SELF-AFFINE; SMALL SCALE; SUPER-HYDROPHOBIC SURFACES; SURFACE ROUGHNESS PROFILES;

ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; DISSOLUTION; HYDROPHOBICITY; PARTIAL DISCHARGES; POROUS SILICON; RECURSIVE FUNCTIONS; SURFACE PROPERTIES; SURFACE ROUGHNESS;

FRACTAL DIMENSION;

EID: 79960034478     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2011.01.046     Document Type: Conference Paper

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