Effect of mask discretization on performance of silicon arrayed waveguide gratings

IEEE Photonics Technology Letters

Volumn 26, Issue 7, 2014, Pages 718-721

  Pathak, Shibnath ^a   Vanslembrouck, Michael ^a   Dumon, Pieter ^a   Van Thourhout, Dries ^a   Verheyen, Peter ^b   Lepage, Guy ^b   Absil, Philippe ^b   Bogaerts, Wim ^a  

^a GHENT UNIVERSITY   (Belgium)

^b IMEC   (Belgium)

Author keywords

Nanophotonics; optical filters; silicon devices; silicon on insulator; wavelength division multiplexing

Indexed keywords

CHANNEL SPACINGS; EXPECTED IMPROVEMENTS; LITHOGRAPHY MASKS; OUTPUT CHANNELS; OUTPUT WAVELENGTHS; SILICON DEVICES; SIMULATION STUDIES; WAVELENGTH CHANNEL SPACING;

CROSSTALK; NANOPHOTONICS; OPTICAL FILTERS; SILICON; SILICON ON INSULATOR TECHNOLOGY; WAVEFORM ANALYSIS; WAVELENGTH DIVISION MULTIPLEXING;

ARRAYED WAVEGUIDE GRATINGS;

EID: 84897860305     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/LPT.2014.2303793     Document Type: Article

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