Vesicle adhesion and rupture on silicon oxide: Influence of freeze-thaw pretreatment

Langmuir

Volumn 30, Issue 8, 2014, Pages 2152-2160

  Jackman, Joshua A ^a,b   Zhao, Zhilei ^a,b   Zhdanov, Vladimir P ^a,b,d   Frank, Curtis W ^e   Cho, Nam Joon ^a,b,c  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c Nanyang Technological University   (Singapore)

^d BORESKOV INSTITUTE OF CATALYSIS   (Russian Federation)

^e Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPARATIVE ANALYSIS; EXPERIMENTAL EVIDENCE; KINETIC ANALYSIS; MODEL CALCULATIONS; MODEL MEMBRANES; QUARTZ CRYSTAL MICROBALANCE WITH DISSIPATION; SILICON OXIDE SUBSTRATES; VESICLE ADHESION;

DYNAMIC LIGHT SCATTERING; FREEZING; SILICON OXIDES; SIZE DISTRIBUTION;

ADHESION;

EID: 84897699362     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la404582n     Document Type: Article

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