Comprehensive study of CoFeB-MgO magnetic tunnel junction characteristics with single- and double-interface scaling down to 1X nm

Technical Digest - International Electron Devices Meeting, IEDM

Volumn , Issue , 2013, Pages

  Sato, H ^a   Yamamoto, T ^a,b   Yamanouchi, M ^a   Ikeda, S ^a   Fukami, S ^a   Kinoshita, K ^a   Matsukura, F ^a   Kasai, N ^a   Ohno, H ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b ULVAC INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84894381849     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IEDM.2013.6724550     Document Type: Conference Paper

References (12)

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