Advanced treatment of semiconductor wastewater by combined MBR-RO technology

Desalination

Volumn 336, Issue 1, 2014, Pages 168-178

  Xiao, Yan ^a   Chen, Tong ^b   Hu, Yongjian ^b   Wang, Deshan ^b   Han, Yongping ^a,c   Lin, Yakai ^b   Wang, Xiaolin ^a  

^a TSINGHUA UNIVERSITY   (China)

^b Beijing Scinor Membrane Technology Co Ltd   (China)

^c BEIJING UNION UNIVERSITY   (China)

Author keywords

Advanced treatment; MBR; Membrane fouling; RO; Semiconductor wastewater

Indexed keywords

ADVANCED TREATMENT; FOULING CHARACTERISTICS; MBR; OPERATIONAL PERFORMANCE; OPERATIONAL STABILITY; RO; SEMICONDUCTOR WASTEWATER; WASTEWATER RECLAMATION AND REUSE;

DEPOSITS; INDUSTRIAL APPLICATIONS; MEMBRANE FOULING; REVERSE OSMOSIS; TECHNOLOGY; WATER CONSERVATION;

WASTEWATER TREATMENT;

BIOREACTOR; FOULING; MEMBRANE; OSMOSIS; POLLUTANT REMOVAL; SEMICONDUCTOR INDUSTRY; WASTE TREATMENT; WASTEWATER;

EID: 84893367042     PISSN: 00119164     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.desal.2013.09.005     Document Type: Article

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