Treating wastewater from CMP using ultrafiltration

MICRO

Volumn 17, Issue 3, 1999, Pages

  Browne, Steven ^a   Krygier, Vivien ^a   O'Sullivan, Joseph ^a   Sandstrom, Eric L ^a  

^a Cirent Semiconductor   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL CLEANING; CONTAMINATION; FOULING; REVERSE OSMOSIS; SLURRIES; ULTRAFILTRATION; WASTEWATER TREATMENT;

CHEMICAL-MECHANICAL PLANARIZATION (CMP); REVERSE FILTRATION (RF); TOTAL SUSPENDED SOLIDS (TSS);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 18244410826     PISSN: 10810595     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (3)