Energy-efficient and temperature-stable oxide-confined 980 nm VCSELs operating error-free at 38 Gbit/s at 85°C

Electronics Letters

Volumn 50, Issue 2, 2014, Pages 103-105

  Li, H ^a   Wolf, P ^a   Moser, P ^a   Larisch, G ^a   Mutig, A ^a   Lott, J A ^a   Bimberg, D ^a,b  

^a TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

^b KING ABDULAZIZ UNIVERSITY   (Saudi Arabia)

Author keywords

[No Author keywords available]

Indexed keywords

CHIP TO CHIPS; ENERGY EFFICIENT; ERROR FREE OPERATIONS; INTRACHIP OPTICAL INTERCONNECTS; MINIMISATION; TEMPERATURE STABILITY; TEMPERATURE STABLE; VERTICAL-CAVITY SURFACE EMITTING LASER;

ENERGY EFFICIENCY; WASTE HEAT;

SURFACE EMITTING LASERS;

EID: 84893366735     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el.2013.3941     Document Type: Article

References (8)

1. Moser, P., Lott, J. A., Wolf, P., Larisch, G., Li, H., Ledentsov, N. N., and Bimberg, D.: '56 fJ dissipated energy per bit of oxide-confined 850 nm VCSELs operating at 25 Gbit/s', Electron. Lett, 2012, 48, (20), pp. 1292-1294
2. Wolf, P., Moser, P., Larisch, G., Li, H., Lott, J. A., and Bimberg, D.: 'Energy efficient 40 Gbit/s transmission with 850 nm VCSELs at 108 fJ/bit dissipated heat', Electron. Lett, 2013, 49, (10), pp. 666-667
3. Moser, P., Wolf, P., Mutig, A., Larisch, G., Unrau, W., Hofmann, W., and Bimberg, D.: '85°C error-free operation at 38 Gb/s of oxide-confined 980-nm vertical-cavity surface-emitting lasers', Appl. Phys. Lett., 2012, 100, (08), pp. 1103
4. Mutig, A., and Bimberg, D.: 'Progress on high-speed 980 nm VCSELs for short-reach optical interconnects', Adv. Opt. Technol, 2011, 2011, pp. 1-15
5. Moser, P., Hofmann, W., Wolf, P., Lott, J. A., Larisch, G., Payusov, A., Ledentsov, N. N., and Bimberg, D.: '81 fJ/bit energy-to-data ratio of 850 nm vertical-cavity surface-emitting lasers for optical interconnects', Appl. Phys. Lett., 2011, 98, (23), p. 1106
6. Hawkins, B., Hawthorne, R., Guenter, J., Tatum, J., and Biard, J.: 'Reliability of various size oxide aperture VCSELs'. Proc. 52nd Conf. Electronic Components and Technology, San Diego, CA, USA, May 2002 pp. 540-550
7. Tan, F., Wu, M.-K., Liu, M., Feng, M., and Holonyak, N.: '850 nm oxide-confined VCSEL with ultralow relative intensity noise and 40 Gb/s error free data transmission', IEEE Photonics Technol. Lett., 2013, 25, (8), pp. 768-771, doi: 10.1109/LPT.2013.2280726
8. Westbergh, P., Safaisini, R., Haglund, E., Gustavsson, J. S., Larsson, A., Geen, M., Lawrence, R., and Joel, A.: 'High-speed oxide confined 850 nm VCSELs operating error-free at 40 Gbit/s up to 85°C', IEEE Photonics Technol. Lett., 2013, 25, (8), pp. 768-771