Fabrication of metal electrodes on flexible substrates by controlled deposition of conductive nano-ink

Materials Letters

Volumn 117, Issue , 2014, Pages 179-183

  Son, Soo Jung ^a,c   Cho, Young Sang ^b   Rha, Jong Joo ^a   Choi, Chul Jin ^a  

^a Korea Institute of Material Science   (South Korea)

^b Korea Polytechnic University   (South Korea)

^c SHANGHAI UNIVERSITY OF ENGINEERING SCIENCE   (China)

Author keywords

Electrical resistance; Flexible substrate; Hydrophobic layer; Metallic nano ink; Nanowire additions

Indexed keywords

AVERAGE PARTICLE SIZE; ELECTRICAL RESISTANCES; FLEXIBLE SUBSTRATE; HYDROPHILIC PROPERTIES; HYDROPHOBIC LAYERS; MECHANICAL SCRATCHING; NANO-INK; SINTERING TEMPERATURES;

DEPOSITION; ELECTRIC PROPERTIES; ELECTRODES; FABRICATION; HYDROPHOBICITY; NANOWIRES; PLASMA ETCHING; SINTERING; SUBSTRATES;

SILVER;

EID: 84890956305     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2013.05.094     Document Type: Article

References (20)

1. G. Mondin, and B. Schumm Microelectron Eng 104 2013 100 104
2. A. Khan, K. Rahman, D.S. Kim, and K.H. Choi J Mater Process Technol 212 2012 700 706
3. D.Y. Lee, E.S. Hwang, T.U. Yu, K.I.M. YJ, and J. Hwang Appl Phys A 82 2006 671 674
4. Y. Kim, B. Lee, S. Yang, I. Byun, I. Jeong, and S.M. Cho Curr Appl Phys 12 2012 473 478
5. S. Merilampi, T. Laine-Ma, and P. Ruuskanen Microelectron Reliab 49 2009 782 790
6. C.J. Weng Mater Sci Semicond Process 13 2010 376 382
7. P. Wrschka, J. Hernandez, G.S. Oehrlein, and J. King J Electrochem Soc 147 2 2000 706 712
8. A. Ramzi, S.A. Charlebois, and P. Krantz Phys Proc 36 2012 211 216
9. B.D. Gates, Q. Xu, M. Stewart, D. Ryan, C.G. Willson, and G.M. Whitesides Chem Rev 105 2005 1171 1196
10. A. Arisha, P. Young, and M.E. Baradie J Mater Process Technol 155-6 2004 2071 2079
11. N. Gao, Y.Y. Yan, X.Y. Chen, and D.J. Mee Mater Lett 65 2011 2902 2905
12. M.A. Samaha, H.V. Tafreshi, and M. Gad-el-Hak C R Mecanique 340 2012 18 34
13. D. Ebert, and B. Bhushan J Colloid Interf Sci 368 2012 584 591
14. Y. Liu, and G. Li J Colloid Interf Sci 388 2012 235 242
15. I.Y. Kim, Y.A. Song, H.C. Jung, J.W. Joung, S.S. Ryu, and J.R. Kim J Electron Mater 37 2008 1863 1868
16. P. Buffat, and J.P. Borel Phys Rev A 13 1976 2287 2298
17. D.J. Lee, J.H. Oh, and H.S. Bae Mater Lett 64 2010 1069 1072
18. D. Zhai, T. Zhang, J. Guo, X. Fang, and J. Wei Colloids Surf A 424 2013 1 9
19. J.S. Kang, J. Ryu, H.S. Kim, and H.T. Hahn J Electron Mater 40 2011 2268 2277
20. Yu Y.H., Ma C.C., Teng C.C., Huang Y.L., Tien H.W., Lee S.H., et al. J Taiwan Inst Chem Eng 2013; 44: 654-659 [JTICE-566]