Top-down meets bottom up: Block copolymers with photoreactive segments

Journal of Photopolymer Science and Technology

Volumn 25, Issue 1, 2012, Pages 17-20

  Maeda, Rina ^a   Chavis, Michelle ^b   You, Nam Ho ^b   Ober, Christopher K ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b School of Chemical and Molecular Engineering   (United States)

Author keywords

Lithography; Nanopattern; Patternable block copolymer; Photoresist; Self assembly

Indexed keywords

EID: 84864423119     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.25.17     Document Type: Article

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