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Volumn 25, Issue 1, 2012, Pages 17-20

Top-down meets bottom up: Block copolymers with photoreactive segments

Author keywords

Lithography; Nanopattern; Patternable block copolymer; Photoresist; Self assembly

Indexed keywords


EID: 84864423119     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.25.17     Document Type: Article
Times cited : (5)

References (11)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.