Low-Loss and high contrast silicon-On-Insulator (SOI) arrayed waveguide grating

CLEO: Science and Innovations, CLEO_SI 2012

Volumn , Issue , 2012, Pages

  Cheung, S T S ^a   Guan, B ^a   Djordjevic, S S ^a   Okamoto, K ^b   Yoo, S J B ^a  

^a University of California Davis   (United States)

^b AiDi Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; SILICON ON INSULATOR TECHNOLOGY; WAVEGUIDES;

ETCHING CONDITION; HIGH CONTRAST; HIGH QUALITY; LOW-LOSS; PHASE ERROR; SILICON-ON- INSULATORS (SOI);

ARRAYED WAVEGUIDE GRATINGS;

EID: 84890618356     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1364/cleo_si.2012.cm4a.5     Document Type: Conference Paper

References (5)

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