Development of redox glasses and subsequent processing by means of pulsed laser deposition for realizing silicon-based thin-film sensors

Electrochimica Acta

Volumn 113, Issue , 2013, Pages 762-767

  Iken, H ^a   Ahlborn, K ^b   Gerlach, F ^b   Vonau, W ^b   Zander, W ^c   Schubert, J ^c   Schoning M J ^a,c  

^a AACHEN UNIVERSITY OF APPLIED SCIENCES   (Germany)

^b KURT SCHWABE INSTITUT FÜR MESS UND SENSORTECHNIK E V MEINSBERG   (Germany)

^c FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Electrochemical thin film sensor; Potentiometry; Pulsed laser deposition; Redox glass

Indexed keywords

EXPANSION COEFFICIENTS; FABRICATED SENSORS; LASER DEPOSITIONS; POTENTIOMETRIC MEASUREMENTS; POTENTIOMETRY; SEMICONDUCTOR TECHNOLOGY; THIN FILM SENSORS; TRANSDUCER STRUCTURE;

FABRICATION; PHOTOELECTRONS; PULSED LASER DEPOSITION; SEMICONDUCTOR DEVICE MANUFACTURE; SENSORS; SILICON; X RAY PHOTOELECTRON SPECTROSCOPY;

GLASS;

EID: 84890550976     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2013.08.092     Document Type: Article

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