The role of electric field during spray deposition on fluorine doped tin oxide film

Journal of Alloys and Compounds

Volumn 588, Issue , 2014, Pages 546-550

  Kumar, Anuj ^a   Swami, Sanjay Kumar ^a   Dutta, Viresh ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

Electric field; Spray process; Transparent conducting oxide

Indexed keywords

ANNULAR ELECTRODES; APPLIED VOLTAGES; CASSITERITE STRUCTURE; ELECTRICAL MEASUREMENT; FLUORINE-DOPED TIN OXIDE FILMS; OPTICAL AND ELECTRICAL PROPERTIES; SPRAY PROCESS; TRANSPARENT CONDUCTING OXIDE;

DEPOSITS; ELECTRIC PROPERTIES; FLUORINE; OXIDE FILMS; SPRAY NOZZLES; SUBSTRATES; TIN; X RAY DIFFRACTION;

ELECTRIC FIELDS;

EID: 84890306261     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2013.11.130     Document Type: Article

References (33)

1. J. Kane, H.P. Schweizer, and W. Kern J. E1ectrochem. Soc. 123 1976 270 277
2. B.J. Baliga, and S.K. Gandhi J. E1ectrochem. Soc. 123 1976 941 944
3. A. Rohatgi, T.R. Viverito, and L.H. Slack J. Am. Ceram. Soc. 57 1974 278 279
4. H. Kim, and H.A. Laitinen J. Am. Ceram. Soc. 58 1975 23 25
5. S.J. Ikhmayies, and R.N. Ahmad-Bitar J. Cent. South Univ. 19 2012 791 796
6. M. Oshima, and K. Yoshino Mater. Sci. Forum 725 2012 281 284
7. V. Bilgin, I. Akyuz, E. Ketenci, S. Kose, and F. Atay Appl. Surf. Sci. 256 2010 6586 6591
8. E. Arca, K. Fleischer, and I.V. Shvets Thin Solid Films 520 2012 1856 1861
9. S.R. Bhattacharyya, and S. Majumder Adv. Sci. Lett. 5 2012 268 274
10. R. Anandhi, K. Ravichandran, and R. Mohan Mater. Sci. Eng. B 178 2013 65 70
11. H. Watanabe Jpn. J. Appl. Phys. 9 1970 1551 1552
12. H.W. Lehmann, and R. Widmer Thin Solid Films 27 1975 359 368
13. F.M. Flore, A.G. Cervantes, K.E. Zepeda, J.G. Galvãn, A.H. Hernãndez, M.L. Olvera, and M.M. Lira Revista Mexicana de Física 59 2013 335 338
14. D.E. Carlson J. Electrochem. Soc. 122 1975 1334 1337
15. S. Roncallo, J.D. Painter, S.A. Ritchie, M.V. Finnis, K.D. Rogers, J.J. Scragg, P.J. Dale, and G. Zoppi Thin Solid Films 519 2011 3544 3551
16. O. Wilhelm, S.E. Pratsinis, D. Perednis, and L.J. Gauckler Thin Solid Films 479 2005 121 129
17. I.B. Rietveld, K. Kobayashi, H. Yamada, and K. Matsushige Soft Matter 5 2009 593 598
18. B. Su, and K.L. Choy Thin Solid Films 361 2000 102 106
19. K.L. Choy, and B. Su Thin Solid Films 388 2001 9 14
20. R. Chandrasekhar, and K.L. Choy Thin Solid Films 398 2001 59 64
21. E.S. Raj, and K.L. Choy Mater. Chem. Phys. 82 2003 489 492
22. W. Siefert Thin Solid Films 120 1984 267 274
23. S.J. Ikhmayies, and R.N. Ahmad-Bitar Renew. Energy 49 2013 143 146
24. A. Nadarajah, M.E. Carnes, M.G. Kast, D.W. Johnson, and S.W. Boettcher Chem. Mater. 25 2013 4080 4087
25. H. Zhao, J. Kiwi, C. Pulgarin, and J. Yang Int. J. Appl. Glass Sci. 4 2013 242 247
26. K.V. Krishna, V. Dutta, and P.D. Paulson Thin Solid Films 444 2003 17 22
27. A.H. Lefebvre Atomization and Sprays 1989 Hemisphere Publishing Corporation New York
28. K. Tang, and A. Gomez Phys. Fluids 6 1994 2317 2332
29. C. Agashe, and S.S. Major J. Mater. Sci. 31 1996 2965 2969
30. S.R. Mahmoudi, K. Adamik, and G.S. Peter Castle Proc. R. Soc. A 467 2011 3257 3271
31. E. Shanti, A. Banerjee, and K.L. Chopra Thin Solid Films 88 1982 93 100
32. G. Haacke J. Appl. Phys. 47 1976 4086 4089
33. M. Fatini, and I. Torriani Thin Solid Films 138 1986 255 265