Ultralow loss single layer submicron silicon waveguide crossing for SOI optical interconnect

Optics Express

Volumn 21, Issue 24, 2013, Pages 29374-29382

  Ma, Yangjin ^a   Zhang, Yi ^a   Yang, Shuyu ^a   Novack, Ari ^b,c   Ding, Ran ^a   Lim, Andy Eu Jin ^b   Lo, Guo Qiang ^b   Baehr Jones, Tom ^a   Hochberg, Michael ^a,b,c  

^a UNIVERSITY OF DELAWARE   (United States)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

^c NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTOLITHOGRAPHY; SILICON; WAVEGUIDES;

1550 NM; CMOS COMPATIBLE; OPTICAL INTERCONNECT; SILICON WAVEGUIDE; SINGLE ETCH; SINGLE LAYER; SUBMICRON; TRANSMISSION INSERTION LOSS;

SILICON WAFERS;

EID: 84890019511     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.21.029374     Document Type: Article

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