Strontium adsorption on tantalum-doped hexagonal tungsten oxide

Journal of Hazardous Materials

Volumn 264, Issue , 2014, Pages 386-394

  Li, Xingliang ^a,b   Mu, Wanjun ^a   Xie, Xiang ^a   Liu, Bijun ^a   Tang, Hui ^a   Zhou, Guanhong ^a   Wei, Hongyuan ^a   Jian, Yuan ^a,b   Luo, Shunzhong ^a  

^a RESEARCH CENTER OF LASER FUSION   (China)

^b SICHUAN UNIVERSITY   (China)

Author keywords

Adsorption; Hexagonal tungsten oxide; Radioactive waste; Ta doped

Indexed keywords

CHLORINE COMPOUNDS; NUCLEAR POWER PLANTS; OXIDES; RADIOACTIVE WASTES; TANTALUM; TUNGSTEN COMPOUNDS;

ACIDIC SOLUTIONS; ADSORPTION CAPACITIES; FREUNDLICH MODELS; HEXAGONAL TUNGSTEN OXIDE; HYDROTHERMAL TREATMENTS; INTERLAYER SPACINGS; PRODUCTION WASTES; TA-DOPED;

ADSORPTION;

STRONTIUM; TANTALUM; TUNGSTEN;

ADSORPTION; CESIUM ISOTOPE; ISOTHERM; NUCLEAR POWER PLANT; NUMERICAL MODEL; RADIOACTIVE WASTE; STRONTIUM; TANTALUM; TUNGSTEN;

ADSORPTION; ANALYTICAL ERROR; ARTICLE; CRYSTAL; DOPING; ENERGY; ISOTHERM; KINETICS; NUCLEAR POWER PLANT; PH; RADIOACTIVE WASTE;

ADSORPTION; HEXAGONAL TUNGSTEN OXIDE; RADIOACTIVE WASTE; SR(2+) ION; TA-DOPED;

ADSORPTION; MODELS, CHEMICAL; OXIDES; STRONTIUM; TANTALUM; TUNGSTEN;

EID: 84889591397     PISSN: 03043894     EISSN: 18733336     Source Type: Journal    
DOI: 10.1016/j.jhazmat.2013.11.032     Document Type: Article

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