Optical and electrochromic properties of RF reactively sputtered WO 3 films

Solid State Ionics

Volumn 165, Issue 1-4, 2003, Pages 175-180

  Washizu, E ^a   Yamamoto, A ^a   Abe, Y ^a   Kawamura, M ^a   Sasaki, K ^a  

^a KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Electrochromic response time; Optical properties; Reactive sputtering; WO3 thin film

Indexed keywords

DEPOSITION; ELECTROLYTES; HIGH TEMPERATURE EFFECTS; REFRACTIVE INDEX; TUNGSTEN COMPOUNDS;

ELECTROCHROMIC RESPONSE TIME; REACTIVE SPUTTERING;

THIN FILMS;

EID: 0345411981     PISSN: 01672738     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssi.2003.08.030     Document Type: Conference Paper

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