Removal of copper vacancies in cuprous oxide single crystals grown by the floating zone method

Crystal Growth and Design

Volumn 13, Issue 11, 2013, Pages 4914-4922

  Chang, Kelvin B ^a   Frazer, Laszlo ^a   Schwartz, Johanna J ^a,d   Ketterson, John B ^a,b   Poeppelmeier, Kenneth R ^a,c  

^a NORTHWESTERN UNIVERSITY   (United States)

^b Northwestern University   (United States)

^c ARGONNE NATIONAL LABORATORY   (United States)

^d Bard College at Simon's Rock   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CUPROUS OXIDE; EXCESS OXYGEN; FLOATING ZONE METHOD; HIGH PURITY; MINIMAL DEFECT; OPTICAL FLOATING ZONES; OXIDIZING ATMOSPHERE; OXYGEN CONCENTRATIONS;

COPPER; OXYGEN;

SINGLE CRYSTALS;

EID: 84887727642     PISSN: 15287483     EISSN: 15287505     Source Type: Journal    
DOI: 10.1021/cg401081m     Document Type: Article

References (47)

1. Raebiger, H.; Lany, S.; Zunger, A. Phys. Rev. B 2007, 76, 045209
2. Anderson, J. S.; Greenwood, N. N. Proc. R. Soc. London, Ser. A 1952, 215, 353
3. Wagner, C.; Hammen, H. Z. Phys. Chem., Abt. B 1938, 40, 197
4. Porat, O. Solid State Ionics 1994, 74, 229
5. O'Keeffe, M.; Moore, W. J. J. Chem. Phys. 1961, 35, 1324
6. Toth, R. S.; Kilkson, R.; Trivich, D. Phys. Rev. 1961, 122, 482
7. Ochin, P.; Petot, C.; Petotervas, G. Solid State Ionics 1984, 12, 135
8. Porat, O.; Riess, I. Solid State Ionics 1995, 81, 29
9. Bardeen, J.; Brattain, W. H.; Shockley, W. J. Chem. Phys. 1946, 14, 714
10. Moore, W. J.; Selikson, B. J. Chem. Phys. 1951, 19, 1539
11. Zhu, Y.; Mimura, K.; Isshiki, M. Oxid. Met. 2004, 62, 207
12. Grzesik, Z.; Migdalska, M. High Temp. Mater. Processes 2011, 30, 277
13. Mysyrowicz, A.; Hulin, D.; Antonetti, A. Phys. Rev. Lett. 1979, 43, 1123
14. Peterson, N. L.; Wiley, C. L. J. Phys. Chem. Solids 1984, 45, 281
15. Sui, Y.; Fu, W.; Yang, H.; Zeng, Y.; Zhang, Y.; Zhao, Q.; Li, Y.; Zhou, X.; Leng, Y.; Li, M.; Zou, G. Cryst. Growth Des. 2010, 10, 99
16. Zhang, Y.; Deng, B.; Zhang, T.; Gao, D.; Xu, A.-W. J. Phys. Chem. C 2010, 114, 5073
17. Lan, X.; Zhang, J.; Gao, H.; Wang, T. CrystEngComm 2011, 13, 633
18. Valodkar, M.; Pal, A.; Thakore, S. J. Alloys Compd. 2011, 509, 523
19. Toth, R. S.; Kilkson, R.; Trivich, D. J. Appl. Phys. 1960, 31, 1117
20. Mani, S.; Jang, J. I.; Ketterson, J. B.; Park, H. Y. J. Cryst. Growth 2009, 311, 3549
21. Naka, N.; Hashimoto, S.; Ishihara, T. Jpn. J. Appl. Phys., Part 1 2005, 44, 5096
22. Yin, Z. G.; Zhang, H. T.; Goodner, D. M.; Bedzyk, M. J.; Chang, R. P. H.; Sun, Y.; Ketterson, J. B. Appl. Phys. Lett. 2005, 86, 061901
23. Markworth, P. R.; Chang, R. P. H.; Sun, Y.; Wong, G. K.; Ketterson, J. B. J. Mater. Res. 2001, 16, 914
24. Dold, P.; Barz, A.; Recha, S.; Pressel, K.; Franz, M.; Benz, K. W. J. Cryst. Growth 1998, 192, 125
25. Harada, K.; Shimanuki, S.; Kobayashi, T.; Saitoh, S.; Yamashita, Y. J. Am. Ceram. Soc. 1998, 81, 2785
26. Isaenko, L.; Krinitsin, P.; Vedenyapin, V.; Yelisseyev, A.; Merkulov, A.; Zondy, J. J.; Petrov, V. Cryst. Growth Des. 2005, 5, 1325
27. Yang, G.; Jie, W.; Wang, T.; Li, G.; Li, W.; Hua, H. Cryst. Growth Des. 2007, 7, 435
28. Ikeda, T.; Marolf, N. J.; Snyder, G. J. Cryst. Growth Des. 2011, 11, 4183
29. Weber, M. J.; Bass, M.; Andringa, K.; Monchamp, R. R.; Comperch., E. Appl. Phys. Lett. 1969, 15, 342
30. Kitamura, K.; Yamamoto, J. K.; Iyi, N.; Kimura, S.; Hayashi, T. J. Cryst. Growth 1992, 116, 327
31. Bohm, J.; Heimann, R. B.; Hengst, M.; Roewer, R.; Schindler, J. J. Cryst. Growth 1999, 204, 128
32. Sabharwal, S. C.; Sangeeta; Desai, D. G. Cryst. Growth Des. 2006, 6, 58
33. Zucker, R. S. J. Electrochem. Soc. 1965, 112, 417
34. Koohpayeh, S. M.; Fort, D.; Abell, J. S. Prog. Cryst. Growth Charact. Mater. 2008, 54, 121
35. Dabkowska, H. A.; Dabkowski, A. B. In Springer Handbook of Crystal Growth; Dhanaraj, G. B., K.; Prasad, V.; Dudley, M., Eds.; Springer-Verlag Berlin Heidelberg: Berlin, Germany, 2010; p 367.
36. O'Keeffe, M.; Moore, W. J. J. Chem. Phys. 1962, 36, 3009
37. Schmidt-Whitley, R. D.; Martinez-Clemente, M.; Revcolevschi, A. J. Cryst. Growth 1974, 23, 113
38. Trivich, D.; Pollack, G. P. J. Electrochem. Soc. 1970, 117, 344
39. Brower, W. S.; Parker, H. S. J. Cryst. Growth 1971, 8, 227
40. Loison, J. L.; Robino, M.; Schwab, C. J. Cryst. Growth 1980, 50, 816
41. Ito, T.; Yamaguchi, H.; Okabe, K.; Masumi, T. J. Mater. Sci. 1998, 33, 3555
42. Hauffe, K.; Kofstad, P. Z. Elektrochem 1955, 59, 399
43. Meijering, J. L.; Verheijke, M. L. Acta Metall. 1959, 7, 331
44. Bloem, J. Philips Res. Rep. 1958, 13, 167
45. Duvvury, C.; Kenway, D. J.; Weichman, F. L. J. Lumin. 1975, 10, 415
46. Ito, T.; Masumi, T. J. Phys. Soc. Jpn. 1997, 66, 2185
47. Koohpayeh, S. M.; Fort, D.; Bradshaw, A.; Abell, J. S. J. Cryst. Growth 2009, 311, 2513