A convenient N 2 -CCl 4 mixture plasma treatment to improve TiO 2 photocatalytic oxidation of aromatic air contaminants under both UV and visible light

Applied Surface Science

Volumn 286, Issue , 2013, Pages 228-234

  Hu, Shaozheng ^a   Li, Fayun ^a   Fan, Zhiping ^a  

^a LIAONING SHIHUA UNIVERSITY   (China)

Author keywords

Chlorine radical; Photocatalysis; Visible light

Indexed keywords

AROMATIC COMPOUNDS; AROMATIZATION; CATALYSTS; CHLORINE; LIGHT; MIXTURES; OXIDATION; PHOTOCATALYSIS; PLASMA APPLICATIONS; TITANIUM DIOXIDE; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

AIR CONTAMINANTS; BENZENE AND TOLUENE; CHLORINE RADICALS; PHOTOCATALYTIC OXIDATIONS; PLASMA TREATMENT; UV AND VISIBLE LIGHT; UV-VIS SPECTROSCOPY; VISIBLE LIGHT;

CHLORINE COMPOUNDS;

EID: 84887503468     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.09.052     Document Type: Article

References (45)

1. M.R. Hoffmann, S.T. Martin, W. Choi, and D.W. Bahnemann Chem. Rev. 95 1995 69 96
2. X.D. Wang, and R.A. Caruso J. Mater. Chem. 21 2011 20 28
3. R. Asahi, T. Morikawa, T. Ohwaki, A. Aoki, and Y. Taga Science 293 2001 269 271
4. M. Sathish, B. Viswanathan, R.P. Viswanath, and C.S. Gopinath Chem. Mater. 17 2005 6349 6354
5. J.L. Gole, J.D. Stout, C. Burda, Y. Lou, and X. Chen J. Phys. Chem. B 108 2004 1230 1240
6. S. Sato, R. Nakamura, and S. Abe Appl. Catal. A: Gen. 284 2005 131 137
7. E.A. Reyes-Garcia, Y. Sun, K. Reyes-Gil, and D. Raftery J. Phys. Chem. C 111 2007 2738 2748
8. X.C. Wang, J.C. Yu, Y.L. Chen, L. Wu, and X.Z. Fu Environ. Sci. Technol. 40 2006 2369 2374
9. S.Z. Hu, F.Y. Li, Z.P. Fan, and C.C. Chang Appl. Surf. Sci. 258 2011 182 188
10. M.S. Vohra, S. Kim, and W. Choi J. Photochem. Photobiol. A: Chem. 160 2003 55 60
11. H. Kim, and W. Choi Appl. Catal. B: Environ. 69 2007 127 132
12. X.T. Hong, Z.P. Wang, W.M. Cai, F. Lu, J. Zhang, Y.Z. Yang, N. Ma, and Y.J. Liu Chem. Mater. 17 2005 1548 1552
13. G. Liu, Z.G. Chen, C.L. Dong, Y.N. Zhao, F. Li, G.Q. Lu, and H.M. Cheng J. Phys. Chem. B 110 2006 20823 20828
14. S. Tojo, T. Tachikawa, M. Fujitsuka, and T. Majima J. Phys. Chem. C 112 2008 14948 14954
15. H. Xu, Z. Zheng, L. Zhang, H. Zhang, and F. Deng J. Solid State Chem. 181 2008 2516 2522
16. X.K. Wang, C. Wang, W.Q. Jiang, W.L. Guo, and J.G. Wang Chem. Eng. J. 189/190 2012 288 294
17. J.G. Li, M. Ikeda, C. Tang, Y. Moriyoshi, H. Hamanaka, and T. Ishigaki J. Phys. Chem. C 111 2007 18018 18024
18. R.A. Spurr, and H. Myers Anal. Chem. 29 1957 760 762
19. J. Lin, Y. Lin, P. Liu, M.J. Meziani, L.F. Allard, and Y.P. Sun J. Am. Chem. Soc. 124 2002 11514 11518
20. X.Z. Shen, Z.C. Liu, S.M. Xie, and J. Guo J. Hazard. Mater. 162 2009 1193 1198
21. H.X. Li, J.X. Li, and Y.N. Huo J. Phys. Chem. B 110 2006 1559 1565
22. S.Z. Chen, P.Y. Zhang, W.P. Zhu, L. Chen, and S.M. Xu Appl. Surf. Sci. 252 2006 7532 7538
23. F. Peng, L.F. Cai, H. Yu, H.J. Wang, and J. Yang J. Solid State Chem. 181 2008 130 136
24. M. Primet, J. Basset, M.V. Matthieu, and M. Prettre J. Phys. Chem. 74 1970 2868 2874
25. K. Yamada, H. Yamane, S. Matsushima, H. Nakamura, K. Ohira, M. Kouya, and K. Kumada Thin Solid Films 516 2008 7482 7487
26. K. Yamada, H. Yamane, S. Matsushima, H. Nakamura, T. Sonoda, S. Miura, and K. Kumada Thin Solid Films 516 2008 7560 7564
27. J. Wang, W. Wu, and D. Feng The Introduction of Electronic Spectroscopy 1992 The Publishing House of Defense Industry Beijing
28. E. Wang, W. Yang, and Y. Cao J. Phys. Chem. C 113 2009 20912 20917
29. J. Zhu, W. Zheng, B. He, J. Zhang, and M. Anpo J. Mol. Catal. A 216 2004 35 43
30. B. Oregan, and M. Gratzel Nature 353 1991 737 740
31. C. Di Valentin, G. Pacchioni, A. Selloni, S. Livraghi, and E. Giamello J. Phys. Chem. B 109 2005 11414 11419
32. C.M. Huang, L.C. Chen, K.W. Cheng, and G.T. Pan J. Mol. Catal. A 261 2007 218 224
33. A.V. Emeline, N.V. Sheremetyeva, N.V. Khomchenko, V.K. Ryabchuk, and N. Serpone J. Phys. Chem. C 111 2007 11456 11462
34. H. Nakajima, T. Mori, Q. Shen, and T. Toyoda Chem. Phys. Lett. 409 2005 81 84
35. J.Y. Shi, J. Chen, Z.C. Feng, T. Chen, Y.X. Lian, X.L. Wang, and C. Li J. Phys. Chem. C 111 2007 693 699
36. J. Yu, L. Yue, S. Liu, B. Huang, and X. Zhang J. Colloid Interface Sci. 334 2009 58 64
37. L.Q. Jing, Y.C. Qu, B.Q. Wang, S.D. Li, B.J. Jiang, L.B. Yang, W. Fu, H.G. Fu, and J.Z. Sun Sol. Energy Mater. Sol. Cells 90 2006 1773 1787
38. Y. Luo, and D.F. Ollis J. Catal. 163 1996 1 11
39. O. d'Hennezel, and D.F. Ollis J. Catal. 167 1997 118 126
40. D. Li, H. Haneda, S. Hishita, and N. Ohashi Chem. Mater. 17 2005 2588 2595
41. D. Li, N. Ohashi, S. Hishita, T. Kolodiazhnyi, and H. Haneda J. Solid State Chem. 178 2005 3293 3302
42. X. Fu, W.A. Zeltner, and M.A. Anderson Appl. Catal. B: Environ. 6 1995 209 224
43. D.S. Bhatkhande, V.G. Pangarkar, and A. Beenackers ACM J. Chem. Technol. Biotechnol. 77 2002 102 116
44. R.C. Weast CRC Handbook of Chemistry and Physics 1st Student ed. 1988 CRC Press Boca Raton, FL
45. X. Wang, J.C. Yu, P. Liu, X. Wang, W. Su, and X. Fu J. Photochem. Photobiol. A: Chem. 179 2006 339 347