Two-photon-induced thiol-ene polymerization as a fabrication tool for flexible optical waveguides

Designed Monomers and Polymers

Volumn 17, Issue 4, 2014, Pages 390-400

  Kumpfmueller, Josef ^a   Stadlmann, Klaus ^a   Li, Zhiquan ^a   Satzinger, Valentin ^b   Stampfl, Juergen ^a   Liska, Robert ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^b JOANNEUM RESEARCH   (Austria)

Author keywords

Polysiloxane; Thiol ene; Two photon polymerization; Waveguides

Indexed keywords

INDUSTRIAL PROCESSS; POLYSILOXANE; POLYSILOXANE MATRIXES; PROOF OF PRINCIPLES; THIOL-ENE POLYMERIZATIONS; THIOL-ENES; TWO-PHOTON-POLYMERIZATION; WAVEGUIDE FABRICATION;

CURING; FABRICATION; OPTICAL WAVEGUIDES; PHOTONS; POLYMERIZATION; REFRACTIVE INDEX; SILICONES; WAVEGUIDES;

HYBRID MATERIALS;

EID: 84887464506     PISSN: 1385772X     EISSN: 15685551     Source Type: Journal    
DOI: 10.1080/15685551.2013.840515     Document Type: Article

References (17)

1. Bosman E, Van Steenberge G, Milenkov I, Panajotov K, Thienpont H, Bauwelinck J, Van Daele P. Fully flexible optoelectronic foil. IEEE J. Sel. Top. Quantum Electron. 2010;16:1355-1362
2. Watanabe T, Ooba N, Hayashida S, Kurihara T, Imamura S. Polymeric optical waveguide circuits formed using silicone resin. J. Lightwave Technol. 1998;16:1049-1055.
3. LaFratta CN, Fourkas JT, Baldacchini T, Farrer RA. Multiphoton fabrication. Angew. Chem. Int. Ed. 2007;46: 6238-6258.
4. Juodkazis S, Mizeikis V, Seet KK, Miwa M, Misawa H. Two-photon lithography of nanorods in SU-8 photoresist. Nanotechnology. 2005;16:846-849.
5. Belfield KD, Schafer KJ. Two-photon photoinitiated polymerization. ACS Symp. Ser. 2003;847:464-481.
6. Hoyle CE, Lee TY, Roper T. Thiol-enes: chemistry of the past with promise for the future. J. Polym. Sci., Part A: Polym. Chem. 2004;42:5301-5338.
7. Joshi MP, Pudavar HE, Swiatkiewicz J, Prasad PN, Reianhardt BA. Three-dimensional optical circuitry using two-photon-assisted polymerization. Appl. Phys. Lett. 1999;74:170-172.
8. Miura K, Qiu J, Inouye H, Mitsuyu T, Hirao K. Photowritten optical waveguides in various glasses with ultrashort pulse laser. Appl. Phys. Lett. 1997;71:3329-3331.
9. Houbertz R, Domann G, Cronauer C, Schmitt A, Martin H, Park JU, Frohlich L, Buestrich R, Popall M, Streppel U, Dannberg P, Wachter C, Brauer A. Inorganic-organic hybrid materials for application in optical devices. Thin Solid Films. 2003;442:194-200.
10. Kumpfmueller J, Stadlmann K, Satzinger V, Li Z, Stampfl J, Liska R. Two-photon-induced microfabrication of flexible optical waveguides. J. Laser Micro/Nanoeng. 2011;6:195-198.
11. Woods R, Feldbacher S, Langer G, Satzinger V, Schmidt V, Kern W. Epoxy silicone based matrix materials for two-photon patterning of optical waveguides. Polymer. 2011;52:3031-3037.
12. Infuehr R, Pucher N, Heller C, Lichtenegger H, Liska R, Schmidt V, Kuna L, Haase A, Stampfl J. Functional polymers by two-photon 3D lithography. Appl. Surf. Sci. 2007;254:836-840.
13. Bichler S, Feldbacher S, Woods R, Satzinger V, Schmidt V, Jakopic G, Langer G, Kern W. Functional flexible organicinorganic hybrid polymer for two photon patterning of optical waveguides. Opt. Mater. 2012;34:772-780.
14. Mogi H, inventor; Toshiba Silicone K. K., Japan, assignee. Preparation of bis(mercaptoalkyl)tetraorganodisiloxanes as surface modifiers for resins. Application: JP patent 90-184262 04074191. 1992. 19900713.
15. Sun H-B, Kawata S. Two-photon photopolymerization and 3D lithographic microfabrication. Adv. Polym. Sci. 2004;170:169-273.
16. Li Z, Pucher N, Cicha K, Torgersen J, Ligon SC, Ajami A, Husinsky W, Rosspeintner A, Vauthey E, Naumov S, Scherzer T, Stampfl J, Liska R. A straightforward synthesis and structure-activity relationship of highly efficient initiators for two-photon polymerization. Macromolecules. 2013;46:352-361.
17. Pucher N, Rosspeintner A, Satzinger V, Schmidt V, Gescheidt G, Stampfl J, Liska R. Structure-Activity relationship in D-pi-A-pi-D-based photoinitiators for the two-photon-induced photopolymerization process. Macromolecules. 2009;42:6519-6528.