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Volumn 285, Issue PARTB, 2013, Pages 389-394

Comparative studies on damages to organic layer during the deposition of ITO films by various sputtering methods

Author keywords

Damage to organic layer; Facing target sputtering (FTS); Kinetic energy control deposition (KECD); Low voltage sputtering (LVS); Magnetron sputtering (MS); PL spectra

Indexed keywords

ALUMINUM COMPOUNDS; DEPOSITION RATES; FACINGS; KINETIC ENERGY; KINETICS; MAGNETRON SPUTTERING; NEGATIVE IONS; OXYGEN;

EID: 84887071543     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.08.065     Document Type: Article
Times cited : (19)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.