Comparative studies on damages to organic layer during the deposition of ITO films by various sputtering methods

Applied Surface Science

Volumn 285, Issue PARTB, 2013, Pages 389-394

  Lei, Hao ^a   Wang, Meihan ^b   Hoshi, Yoichi ^c   Uchida, Takayuki ^c   Kobayashi, Shinichi ^c   Sawada, Yutaka ^c  

^a INSTITUTE OF METAL RESEARCH   (China)

^b SHENYANG UNIVERSITY   (China)

^c TOKYO POLYTECHNIC UNIVERSITY   (Japan)

Author keywords

Damage to organic layer; Facing target sputtering (FTS); Kinetic energy control deposition (KECD); Low voltage sputtering (LVS); Magnetron sputtering (MS); PL spectra

Indexed keywords

ALUMINUM COMPOUNDS; DEPOSITION RATES; FACINGS; KINETIC ENERGY; KINETICS; MAGNETRON SPUTTERING; NEGATIVE IONS; OXYGEN;

COMPARATIVE STUDIES; CONVENTIONAL MAGNETRON SPUTTERING; FACING TARGET SPUTTERING; LOW-VOLTAGE SPUTTERING; ORGANIC LAYERS; PHOTOLUMINESCENCE SPECTRUM; PL SPECTRA; TRANSPARENT CONDUCTIVE OXIDES;

ALUMINUM COATINGS;

EID: 84887071543     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.08.065     Document Type: Article

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