Silicon sheets by redox assisted chemical exfoliation

Journal of Physics Condensed Matter

Volumn 25, Issue 44, 2013, Pages

  Tchalala, Mohamed Rachid ^a,b   Ali, Mustapha Ait ^b   Enriquez, Hanna ^a   Kara, Abdelkader ^c   Lachgar, Abdessadek ^d   Yagoubi, Said ^e   Foy, Eddy ^f   Vega, Enrique ^f   Bendounan, Azzedine ^g   Silly, Mathieu G ^g   Sirotti, Fausto ^g   Nitshe, Serge ^h   Chaudanson, Damien ^h   Jamgotchian, Haik ^h   Aufray, Bernard ^h   Mayne, Andrew J ^a   Dujardin, Gérald ^a   Oughaddou, Hamid ^a,i  

^a INSTITUT DES SCIENCES MOLÉCULAIRES D ORSAY   (France)

^b CADI AYYAD UNIVERSITY   (Morocco)

^c UNIVERSITY OF CENTRAL FLORIDA   (United States)

^d WAKE FOREST UNIVERSITY   (United States)

^e CEA Saclay   (France)

^f CEA SACLAY   (France)

^g SYNCHROTRON SOLEIL   (France)

^h AIX MARSEILLE UNIVERSITÉ   (France)

ⁱ UNIVERSITÉ DE CERGY PONTOISE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CALCIUM DISILICIDE; CHEMICAL EXFOLIATIONS; CRYSTALLINE SILICONS; ENERGY DISPERSIVE X-RAY SPECTROSCOPY; GRAM-SCALE QUANTITY; GRAPHITIC STRUCTURES;

ENERGY DISPERSIVE SPECTROSCOPY; PHOTOELECTRONS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON;

EID: 84886928779     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/25/44/442001     Document Type: Article

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