Effects of the physical parameters of a microwave plasma jet on the inactivation of fungal spores

Thin Solid Films

Volumn 547, Issue , 2013, Pages 125-131

  Na, Young H ^a   Park, Gyungsoon ^a   Choi, Eun H ^a   Uhm, Han S ^a  

^a Kwangwoon University   (South Korea)

Author keywords

Atmospheric pressure; Fungal spores; Microwave; Plasma jet; Sterilization

Indexed keywords

FILAMENTOUS FUNGI; FUNGAL SPORES; FUSARIUM GRAMINEARUM; FUSARIUM OXYSPORUMS; INHIBITION EFFECT; MICROWAVE PLASMA JET; PHYSICAL CONDITIONS; PHYSICAL PARAMETERS;

ATMOSPHERIC PRESSURE; CULTIVATION; ELECTRIC DISCHARGES; MICROWAVES; OXYGEN; PLASMA JETS; PLASMAS; STERILIZATION (CLEANING);

FUNGI;

EID: 84886804491     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.04.055     Document Type: Conference Paper

References (18)

1. H.S. Uhm, Y.C. Hong, and D.H. Shin Plasma Sources Sci. Technol. 15 2 2006 S26
2. D.H. Shin, C.U. Bang, J.H. Kim, K.H. Han, Y.C. Hong, H.S. Uhm, D.K. Park, and K.H. Kim Surf. Coat. Technol. 201 9-11 2007 4939
3. T. Shimizu, B. Steffes, R. Pompl, F. Jamitzky, W. Bunk, K. Ramrath, M. Georgi, W. Stolz, H.U. Schmidt, T. Urayama, S. Fujii, and G.E. Morfill Plasma Processes Polym. 5 6 2008 577
4. J.H. Kim, M. Kataoka, Y.A. Kim, D. Shimamoto, H. Muramatsu, T. Hayashi, M. Endo, M. Terrones, and M.S. Dresselhaus Appl. Phys. Lett. 93 22 2008
5. T. Nosenko, T. Shimizu, and G.E. Morfill New J. Phys. 11 2009
6. G.N. Agrios Plant Pathology 1997 Academic Press London
7. R. Ben-Ami, R.E. Lewis, and D.P. Kontoyiannis Br. J. Haematol. 150 4 2010 406
8. E. Zhang, T. Tanaka, M. Tajima, R. Tsuboi, A. Nishikawa, and T. Sugita Microbiol. Immunol. 55 9 2011 625
9. R. Alonso-Monge, E. Roman, D.M. Arana, J. Pla, and C. Nombela Clin. Microbiol. Infect. 15 Suppl. 1 2009 17
10. K. Lee, K.H. Paek, W.T. Ju, and Y. Lee J. Microbiol. 44 3 2006 269
11. P. Muranyi, J. Wunderlich, and M. Heise J. Appl. Microbiol. 103 5 2007 1535
12. M. Korachi, and N. Aslan Plasma Sci. Technol. 13 1 2011 99
13. J.P. Lim, H.S. Uhm, and S.Z. Li Phys. Plasmas 14 9 2007
14. C. Nathan, and M.U. Shiloh PNAS 97 16 2000 8841
15. S.G. Rhee Science 312 2006 1882
16. S. Kalghatgi, C.M. Kelly, E. Cerchar, B. Torabi, O. Alekseev, A. Fridman, G. Friedman, and J. Azizkhan-Clifford PLoS One 6 1 2011 e16270
17. M.A. Lieberman, and A.J. Lichtenberg Principle of Plasma Discharge and Material Processing 1995 Wiley and Son New York, NY 255
18. Q. Yang, and K.A. Borkovich Genetics 151 1 1999 107