Ion beam etching of a flat silicon mirror surface: A study of the shape error evolution

Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Volumn 710, Issue , 2013, Pages 98-100

  Preda, I ^a,b   Vivo, A ^b   Demarcq, F ^b   Berujon, S ^b,c   Susini, J ^b   Ziegler, E ^b  

^a ALBA SYNCHROTRON LIGHT SOURCE   (Spain)

^b EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^c DIAMOND LIGHT SOURCE LTD   (United Kingdom)

Author keywords

Focusing; Ion beam figuring; X ray mirror; X ray optics

Indexed keywords

ETCHING; FOCUSING; IONS; MIRRORS; X RAY OPTICS;

BASIC PRINCIPLES; ION BEAM ETCHING; ION BEAM FIGURING; MEAN ROUGHNESS; MIRROR FIGURE; SILICON MIRRORS; X RAY MIRRORS; X-RAY MIRROR SURFACES;

ION BEAMS;

EID: 84886429772     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nima.2012.10.136     Document Type: Article

References (8)

1. J. Susini, Design parameters for hard x-ray mirrors: the European synchrotron radiation facility, Optical Engineering 34 (1995) 361.
2. L. Peverini, et al., Nuclear Instruments and Methods in Physics Research A 616 (2010) 115.
3. R. Mercier, M. Mullot, M. Lamare, G. Tissot, Review of Scientific Instruments 72 (2001) 1559.
4. A. Schindler, et al., in: H.P. Stahl (Ed.), Optical Manufacturing and Testing, vol. V, SPIE, San Diego, CA, USA, 2003, p. 64.
5. J.M. Lackner, et al., Vacuum 83 (2009) 302.
6. A. Rommeveaux, et al., SPIE Proceedings 6704 (2007) 67040B-1-67040B-12.
7. L. Assoufid, et al., SPIE Proceedings 5921 (2005) 129.
8. E. Ziegler, et al., Ninth International Conference on Synchrotron Radiation Instrumentation, in: J.-Y. Choi, S. Rah (Eds.), Proceedings, vol. 879, Daegu, Korea, 2006, pp. 778-781.